hearthsとは 意味・読み方・使い方

A protective film of a protective-film-forming vapor deposition material 15 is formed on the surface of the substrate by means of an evaporation build-up means that evaporates vapor deposition material particles from the protective-film-forming vapor deposition materials 15 placed in the hearths.例文帳に追加

ハースに入れられた保護膜用蒸着材１５から蒸着材粒子を蒸発させて基板表面に堆積させる蒸発堆積手段により基板表面に保護膜用蒸着材１７が形成される。 - 特許庁

At this time, exfoliated furnace hearths 16A, 16B, or the like, exfoliated from the shifting hearth 11 are continuously removed with an exfoliated furnace hearth removing means 15 or the like, while opening the reduction furnace.例文帳に追加

この際に、移動床１１から剥離した剥離炉床１６Ａ〜１６Ｃを還元炉を操業しながら連続的に剥離炉床除去手段１５、２１で取り除く。 - 特許庁

While previous cooking hearths could not provide food for a large number of people due to the time and effort required, kamado could supply a lot of people with meals by using high temperature and continuous and concentrated cooking, and this caused the centralization of the population caused by this, and can be seen to have promoted civilization.発音を聞く 例文帳に追加

従来の炉が調理に手間が掛かっていたために食が賄える人の数はそれほど多くなかったのに対し、竈では高温での連続集中調理で多くの人の食事が賄え、これにより人口の集中が発生、そこに文明が育まれたとみなすことも出来よう。 - Wikipedia日英京都関連文書対訳コーパス

The vapor deposition material 15 for forming the irregularities 17b of the protective film 17 on the surface of the base is placed in 2, 3, or more second hearths 12 spacedly surrounding the first hearth and spaced from each other at a specified distance.例文帳に追加

第１ハースを所定の間隔をあけて囲むとともに互いに所定の間隔をあけて配設された２又は３以上の第２ハース１２に、ベース部表面に保護膜の凹凸部１７ｂを形成するための保護膜用蒸着材１５が入れられる。 - 特許庁

In the film deposition method, a vacuum tank 11, a hollow cathode type electron gun 20, and a plurality of hearths 31, 31 ... to store metallic materials M1, M2, ... are assembled to each other, and the metallic materials M1, M2, ... are simultaneously evaporated by successively applying the anode voltage to each hearth 31.例文帳に追加

真空槽１１と、ホローカソード形の電子銃２０と、金属材料Ｍ1 、Ｍ2 …を収納する複数のハース３１、３１…とを組み合わせ、各ハース３１に陽極電圧を順次印加して金属材料Ｍ1 、Ｍ2 …を同時に蒸発させる。 - 特許庁

The film formation device is provided with: a vacuum tank 11 having an N2 gas introduction means; hearths 31, 31 for M (M denotes Ti or Cr) or for Al; hollow cathode-shaped electron guns 20, 20; an electron beam source; a bias source for workpieces W, W, ...; a mass analyzer 50; and a compositional ratio control system.例文帳に追加

Ｎ2 ガスの導入手段を有する真空槽１１と、Ｍ（Ｍは、Ｔi またはＣr ）用、Ａl 用のハース３１、３１と、ホローカソード形の電子銃２０、２０と、電子ビーム電源と、ワークＷ、Ｗ…用のバイアス電源と、質量分析計５０と、組成比制御系とを設ける。 - 特許庁