peripheral defectとは 意味・読み方・使い方

The defect determination means determines whether a pixel of interest is a defect or not, on the basis of the pixel value of the pixel of interest and pixel values of peripheral pixels.例文帳に追加

キズ判定手段は、注目画素の画素値と複数の周辺画素の画素値とに基づいて、注目画素がキズであるか否かを判定する。 - 特許庁

Brightness data of each pixel of a point defect or a strain defect having a smaller area than an irregular defect in the image data acquired in the inspection image acquisition process is replaced with an interpolation value based on brightness data of a peripheral pixel, to thereby repair the non-evaluation object defect species (point/strain defect repair process ST200).例文帳に追加

検査画像取得工程にて取得された画像データ中でムラ欠陥よりも面積が小さい点欠陥、シミ欠陥の各画素の輝度データを周囲の画素の輝度データに基づく補間値で置き換えてこの非評価対象欠陥種を修補する（点・シミ欠陥修補工程ＳＴ２００）。 - 特許庁

To certainly and clearly detect even a fine defect occurring in the inner peripheral surface of a narrow pipe.例文帳に追加

細い管体の内周面に発生した微細な欠陥であっても、確実・明確に検出する。 - 特許庁

METHOD FOR ELIMINATING DEFECT OF PERIPHERAL PART OF SLIDER OCCURRING IN CONVENTIONAL MACHINING PROCESSES例文帳に追加

従来の機械加工工程によるスライダ周縁部の欠陥を排除する方法 - 特許庁

To prevent occurrence of an element defect by obstructing peeling of an ITO film on the outer peripheral part of a wafer substrate.例文帳に追加

ウェハ基板外周部のＩＴＯ膜の膜剥がれを阻止して、素子不良の発生を防止する。 - 特許庁

A defect detection circuit 12 compares the picture signal of a target pixel with the picture signal of peripheral pixels, detects a pixel defect candidate and stores the address information of the pixel defect candidate in a position memory circuit 13.例文帳に追加

欠陥検出回路１２で目標画素の画像信号を周辺画素の画像信号と対比して画素欠陥候補を検出し、画素欠陥候補のアドレス情報を位置メモリ回路１３に記憶する。 - 特許庁

for example, in the defect detecting test of this form, data are written in only the inner peripheral side adjacent data track in the inner peripheral side region and data are written in only the outer peripheral side adjacent data track in the outer peripheral side region.例文帳に追加

例えば、本形態の欠陥検出テストは、内周側領域において内周側隣接データ・トラックのみに書き込み、外周側領域において外周側隣接データ・トラックのみに書き込む。 - 特許庁

To provide a method for correcting a defect part, by which a defect part is corrected and a flatness being the specification of a photomask is secured when a defect part such as a crack or chipped part is caused in the peripheral part of a glass substrate, in a glass substrate for a photomask formed of synthetic quartz or a photomask using the glass substrate.例文帳に追加

合成石英からなるフォトマス用のガラス基板や該ガラス基板を用いたフォトマスクにおいて、ガラス基板の周辺部にひび、欠けの欠陥部が生じた場合に、該欠陥部を修正でき、且つ、フォトマスクの仕様であるフラットネスを確保できる方法を提供する。 - 特許庁