りん酸濃度の英語

リン酸またはリン酸基を含む化合物の濃度測定方法例文帳に追加

METHOD FOR MEASURING CONCENTRATION OF COMPOUND CONTAINING PHOSPHORIC ACID OR PHOSPHATE RADICAL - 特許庁

表面の少なくとも一部分において、当該表面におけるフッ素原子とリン原子との濃度比（フッ素原子濃度／リン原子濃度）が、該表面から２０００ｎｍの深さにおけるフッ素原子とリン原子との濃度比（フッ素原子濃度／リン原子濃度）に比べて大きいことを特徴とするリン酸塩系ガラス体。例文帳に追加

In the phosphate-based glass body, the ratio of the concentration of fluorine atom and phosphorus atom (fluorine atom concentration/phosphorus atom concentration) in at least a part of the surface is larger than that in the depth 2,000 nm deep from the surface. - 特許庁

生石灰と酸素及び／又は酸化鉄による溶銑脱燐処理において、処理後のスラグに含まれるAl_2O_3濃度とSiO_2濃度の合計を１５〜４０％とし、Al_2O_3濃度をSiO_2濃度よりも高くすること特徴とする溶銑の脱燐精錬方法。例文帳に追加

In the dephosphorizing treatment for molten iron with the lime and oxygen and/or iron oxide, peculiarly, the total of Al2O3 concentration and SiO2 concentration contained in the slag after treating is made to 15-40% and the Al2O3 concentration is higher than the SiO2 concentration. - 特許庁

りん酸とシリカイオン存在下における希薄砒素濃度の測定方法例文帳に追加

METHOD FOR MEASURING THIN ARSENIC CONCENTRATION UNDER EXISTENCE OF PHOSPHORIC ACID AND SILICA ION - 特許庁

助剤が混合された超臨界二酸化炭素を循環させた基板洗浄が行われると、濃度検出器１１が超臨界二酸化炭素中の助剤濃度を検出し、濃度制御器１２が検出濃度に従って助剤濃度を常に所定値に保つように、バルブ開閉を制御する。例文帳に追加

When substrate cleaning, for which the supercritical carbon dioxide mixed with the agent is circulated is performed, the density detector 11 detects the agent density in the supercritical carbon dioxide and the density controller 12 controls the valve opening and closing, so as to keep the agent density at the prescribed value at all times according to the detected density. - 特許庁

更に具体的な作用としては、体重増加の抑制、血中レプチン濃度の上昇、血中グルコース濃度の低下、血中インスリン濃度の低下、血中遊離脂肪酸濃度の低下の各作用が例示される。例文帳に追加

Each activity of the suppression of weight gain, the increase of leptin concentration in the blood, the decrease of glucose concentration in the blood, the decrease of insulin concentration in the blood and the decrease of free fatty acid concentration in the blood is exemplified as the concrete activities. - 特許庁

自然酸化膜１１を有するシリコン基板１０にＡｓを注入すると、アモルファス領域１０ａが形成され、アモルファス領域１０ａは、酸素濃度が臨界値以上の高濃度酸素領域１０aaと、酸素濃度が臨界値よりも低い低濃度酸素領域１０abとに分かれる。例文帳に追加

When As is injected into a silicon substrate 10 having a natural oxidation film 11, an amorphous region 10a is formed, and the amorphous region 10a is divided into a high concentration oxygen region 10aa where the oxygen concentration is more than a critical value and a low concentration oxygen region 10ab where the oxygen concentration is lower than the critical value. - 特許庁

自然酸化膜１１を有するシリコン基板１０にＡｓを注入すると、アモルファス領域１０ａが形成され、アモルファス領域１０ａは、酸素濃度が臨界値以上の高濃度酸素領域１０aaと、酸素濃度が臨界値よりも低い低濃度酸素領域１０abとに分かれる。例文帳に追加

When As is implanted into a silicon substrate 10 having a native oxide film 11, an amorphous region 10a is formed and the amorphous region 10a is divided into a high concentration oxygen region 10aa having oxygen concentration of critical level or above, and a low concentration oxygen region 10ab having oxygen concentration lower than the critical level. - 特許庁