公磨の英語

さらに、前記フォトマスク基板は、それ自体が研磨手段の間で自転及び公転する研磨装置において研磨されるものである。例文帳に追加

The photomask substrate is polished, by a polishing device in which the substrate revolves and rotates in a polishing means. - 特許庁

研磨工具を自転回転させる自転回転軸と、前記研磨工具を公転回転させる公転回転軸と、前記研磨工具の公転半径を変化させる移動機構とを有することを特徴とする。例文帳に追加

This polishing device has a rotary shaft for rotating a polishing tool by itself, a revolving shaft for revolving the polishing tool, and a mobile mechanism for changing a revolving radius of the polishing tool. - 特許庁

本発明の研磨装置１０は、送りテーブル１４を搬送しながら、研磨パッド１６を公転（及び／又は自転）させるとともに被研磨物１２をその中心に回転させて被研磨物１２の研磨面を多数の研磨パッド１６、１６…によって連続的に研磨する。例文帳に追加

The polishing apparatus 10, makes a polishing pad 16 revolve (and/or rotate), makes the polished object 12 rotate around the center and continuously polishes the polishing surface of the polished object 12 with a large number of polishing pads 16, 16, ... while transporting a feeding table 14. - 特許庁

研磨装置１は、配管１００の端部を固定する固定部５と、固定された配管端部を研磨する研磨体６と、研磨体６を回転する軸の回りに自転させる自転手段７と、研磨体６を配管１００の周方向に公転する公転手段８を備える。例文帳に追加

The polishing apparatus 1 includes a fixing portion 5 for fixing the end of the line 100; a polisher 6 for polishing the fixed end of the line; a rotation means 7 for rotating the polisher 6 about a rotating shaft; and a revolution means 8 for causing the polisher 6 to revolve in the circumferential direction of the line 100. - 特許庁

光学研磨用酸化セリウム研磨剤廃液からの酸化セリウム回収方法及び光学研磨用酸化セリウム研磨剤廃液の無公害化処理方法例文帳に追加

METHOD FOR RECOVERING CERIUM OXIDE FROM WASTE LIQUID OF CERIUM OXIDE POLISHING AGENT FOR OPTICAL POLISHING AND NON-POLLUTING TREATMENT METHOD FOR WASTE LIQUID OF CERIUM OXIDE POLISHING AGENT FOR OPTICAL POLISHING - 特許庁

本発明は、光学研磨用酸化セリウム研磨剤廃液からの酸化セリウム回収方法及び光学研磨用酸化セリウム研磨剤廃液の無公害化処理方法を提案する。例文帳に追加

To provide a method for recovering cerium oxide from the waste liquid of a cerium oxide polishing agent for optical polishing and a non-polluting treatment method for the waste liquid of the cerium oxide polishing agent for optical polishing which are efficient, are low in a treatment cost, save labor and are extremely high in practicable value. - 特許庁

研磨パッドの設計者は、公知のパッドと比較して、より有効かつ有用な研磨パッドを実現する溝パターンを常に追求している。例文帳に追加

To provide a polishing pad having a groove pattern realizing a more effective and useful polishing pad in comparison with a well-known pad. - 特許庁

公転及び自転を伴う運動、前後及び揺動運動を伴う運動を研磨部材の取り替えだけで設定できるようにした研磨装置。例文帳に追加

To provide a polishing device in which a movement accompanying revolution and rotation, and a movement accompanying back-and-forth and swing movements are settable only by replacement of a polishing member. - 特許庁