和範の英語

これらの画像形成条件を構成する直流現像バイアスＶavgおよび露光エネルギーＥはそれぞれ濃度飽和範囲および漸近範囲に存在している。例文帳に追加

The DC development bias V_avg and the exposure energy E constituting these image forming conditions exist in a density saturation range and a gradually approaching range respectively. - 特許庁

プラズマ処理パラメタは、プラズマ処理により不純物濃度が基準値に等しくなる基板表面からの深さを決定づける主パラメタ例えばバイアス電圧と、不純物濃度を基準値に飽和させる飽和範囲をもつ副パラメタ例えばプラズマ処理時間と、を含む。例文帳に追加

The plasma processing parameter includes a main parameter, a bias voltage for example, that determines the depth from the surface of the substrate at which an impurity concentration becomes equal to a reference value by the plasma processing, and a sub parameter, a plasma processing time for example, that has a saturation range in which the impurity concentration is made to saturate at the reference value. - 特許庁