方位鏡の英語

全方位カメラ１０は、反射鏡１３と、反射鏡１３に映し出された映像を撮像するカメラ１４とを有する。例文帳に追加

The omnidirectional camera 10 is provided with a reflecting mirror 13 and a camera 14 for picking up an image reflected on the reflecting mirror 13. - 特許庁

カプセル内視鏡プロセッサは、カプセル方位情報、カプセル加速度情報、受信機方位情報、および受信機加速度情報に基づいて、外部受信機２０に対するカプセル内視鏡の相対姿勢を算出する。例文帳に追加

The capsule endoscope processor calculates the relative attitude of the capsule endoscope relative to the external receiver 20 based on the capsule direction information, the capsule acceleration information, the receiver direction information and the receiver acceleration information. - 特許庁

試料へ温度負荷を印加した状態でも容易に解析可能な偏光顕微鏡型の結晶方位解析装置および偏光顕微鏡方式の結晶方位解析方法を提供する。例文帳に追加

To provide a polarization microscope type crystal orientation analysis apparatus in which analysis is easily performed even in a state that a temperature load is applied on a sample, and to provide a polarization microscope type crystal orientation analysis method. - 特許庁

トータルステーション２も、無線方位測定装置を備え、望遠鏡２７の向く方向Ｔと前記電波の到来方向Ｗのなす方位角Ｄ’を求め、Ｄ’＝Ｄ−１８０°となるように、望遠鏡２７を回転させる。例文帳に追加

The station 2 is also provided with a radio direction finder, an azimuth D' which an oriented direction T of a telescope 27 forms with respect to the direction W of the radio wave is found to rotate the telescope 27 to come to D'=D-180°. - 特許庁

先ず太陽光の方位と仰角を「ヘリオスタット鏡」で楕円面鏡の光軸に平行に合わせ、楕円面鏡の第１の焦点に設置した丸い棒の形の「グラファイト」を熱する。例文帳に追加

The azimuth and elevation angle of solar light are first adjusted into a parallel relation to the optical axis of the ellipsoidal mirror by a heliostat mirror to heat a round bar of graphite set at the first focus of the ellipsoidal mirror. - 特許庁

凸面鏡である半径ｒの球面鏡の監視側半面から成る反射鏡５と、２次元ＣＣＤカメラ等から成る撮像手段６とにより特定方位視覚センサ１０を構成する。例文帳に追加

A particular direction visual sensor 10 is composed of a reflector 5 which is a convex mirror comprising a monitoring side hemihedry of a spherical mirror with a radius r and an image pickup means 6 comprising a two dimensional CCD camera or the like. - 特許庁

アルカリエッチング後の半導体ウエーハ外周面取り部の鏡面研磨において、前記半導体ウエーハの結晶方位により面取り部の鏡面研磨条件を変更して鏡面研磨する、あるいは前記面取り部の表面粗さのレベルに従い面取り部の鏡面研磨条件を変更して鏡面研磨する半導体ウエーハ外周部の鏡面面取り方法並びに鏡面面取り装置。例文帳に追加

The peripheral chamfering part of a semiconductor wafer after being subjected to alkali etching is polished into specular surface while the polishing conditions for the chamfered part are changed according to the crystalline azimuth of the wafer, or otherwise specular polishing is performed while the polishing conditions for the chamfered part are changed according to the level of surface roughness of the chamfered part. - 特許庁

全方位カメラ１０は、反射鏡１３と、反射鏡１３に映し出された映像を撮像するカメラ１４と、反射鏡１３とカメラ１４を保持するケーシング１１とを有し、ケーシング１１のうち反射鏡１３の全周囲が透明なカバー部材１２で構成される。例文帳に追加

The omnidirectional camera 10 has a reflecting mirror 13, a camera 14 to photograph the image reflected by the mirror 13, and a casing 11 to hold the mirror 13 and the camera 14, wherein that portion of the casing 11 mating with the whole periphery of the mirror 13 is formed from a transparent cover member 12. - 特許庁