粗磨きの英語

放電加工した金型の手磨きの欠点を克服し、短時間に低い表面粗さの仕上げを目的とする。例文帳に追加

To finish a metal mold with low surface roughness in a short time by overcoming a fault in hand polishing the mold which is applied to electrical discharge machining. - 特許庁

金属被膜表面処理、非金属被膜表面処理、又はそれらの複合被膜表面処理を施し、必要に応じて磨きを行い、金型の表面粗さＲｚ（十点平均粗さ）を０．００１〜０．５μｍにする。例文帳に追加

Metal film surface treatment, a nonmetal film surface treatment or composite film surface treatment of them is applied to a mold and, if necessary, the surface of the mold is polished to set the surface roughness Rz (ten- score average roughness) of the mold to 0.001-0.5 μm. - 特許庁

デュープレックス方式のガラス板の製造設備におけるガラス磨き工程において、研磨材の種類を選定し、短時間で所望の表面粗さに到達し研磨ムラなきよう研磨する板ガラスの研磨方法を提供する。例文帳に追加

To provide a glass sheet grinding method for selecting the type of an abrasive material and grinding a glass sheet with no grinding irregularity in glass grinding processes in duplex-type glass sheet manufacturing facilities to attain desired surface roughness in a short time. - 特許庁

ポリエステル樹脂を含有する熱可塑性樹脂組成物を用いて、算術平均表面粗さＲａが０．０７５μｍ以下である金型、磨き番手５０００番以上で表面を磨いた金型又はクロムめっきした金型で成形することを特徴とする光反射体用成形品の製造方法。例文帳に追加

A method of manufacturing a molding for a light reflector is characterized in that a thermoplastic resin composition containing a polyester resin is used to mold the molding by: a mold whose arithmetic average surface roughness Ra is at most 0.075 μm; a mold which has polished the surface with a polishing yarn count of at least No.5000; or a mold which has been chromium plated. - 特許庁

函１の中仕切り７による角型のポケット８の内面に対し、磨き、粗し、削り、印刷の除去、貼着物の除去、ゴミの除去、汚れの除去、洗い、を始めとする各種処理の少なくとも１つを行うのに、函１の各ポケット８につき、それとほぼ相似な角型のブラシ４１の上下移動による処理と、回転するブラシ８１による処理とを異時に行うことにより上記の目的を達成する。例文帳に追加

For applying at least one of various treatment including polishing, roughening, shaving, removing print, removing stuck matter, removing dust, removing stain, and washing to the inner faces of rectangular pockets 8 formed by the partitions 7, treatment by vertically moving a rectangular brush 41 roughly similar to the pocket 8 of a box 1 and treatment by a rotating a brush 81 are performed not concurrently. - 特許庁