荷電密度分布の英語

描画中の電流密度分布の自動調整が可能な荷電粒子ビーム描画装置および荷電粒子ビーム描画方法を提供する。例文帳に追加

To provide a charged particle beam drawing device and a charged particle beam drawing method which can automatically adjust the current density distribution during drawing. - 特許庁

精度よく、被処理物品のプラズマ処理に悪影響を与えないでプラズマ中の荷電粒子の密度や荷電粒子の電位分布を簡易に求めることができる荷電粒子電流計測装置及びプラズマ処理装置を提供する。例文帳に追加

To provide a charged particle current measuring device and a plasma processing device which can accurately and easily determine the density of a charged particle and the electric potential distribution of a charged particle in plasma without negatively affecting the plasma processing of a work piece. - 特許庁

被処理物のチルト角を０度よりも大きく設定可能な装置において、被処理物内に位置する任意のＺ座標位置における荷電粒子ビームの電流密度分布を測定する方法、同分布を所望のものに調整する方法等を提供する。例文帳に追加

To provide a method for measuring a current density distribution of charged particle beams at an arbitrary Z coordinate position disposed in a material to be treated in an apparatus for largely setting a tilt angle of the material to larger than 0 degree and a method for regulating it as desired. - 特許庁

荷電粒子線走査式装置において、単一荷電粒子線の形状、寸法、密度分布を正確かつ効率的に検出し、またその結果を表示または記録することで、電子光学系調整作業の簡略化と確実性を向上させる。例文帳に追加

To improve in simplification and certainty of electron-optical adjustment works of a charged particle beam scanning device through accurate and effective detection of shapes, sizes and density distribution of single charged- particle beams as well as display and recording of the result. - 特許庁