equivalent reflection factorとは 意味・読み方・使い方

When a wafer 20 is heat-treated by irradiating with a lamp light from the side of a device forming region where a semiconductor device is formed, the SiN film 25 of a film thickness which has a reflection factor equivalent to the average reflection factor of the device forming region is formed at the peripheral end on the outside of the device forming region before the heat treatment.例文帳に追加

半導体装置が形成されるデバイス形成領域の側からランプ光を照射してウェハ２０の熱処理を行う場合、その熱処理前に、デバイス形成領域の平均的な反射率と同等の反射率となるような膜厚のＳｉＮ膜２５を、デバイス形成領域外側の周端部に形成する。 - 特許庁

To attain a low-reflection structure by using a material which has the index of refraction higher than the index of refraction of a silicon nitride film, while having little attenuation of light in a film thanks to an absorption coefficient equivalent to the silicon nitride film, and which does not serve as a factor for increasing dark current caused by metal contamination.例文帳に追加

シリコン窒化膜の屈折率より高い屈折率を有し、かつシリコン窒化膜と同等の吸収係数により膜中の減衰が殆どなく、金属汚染による暗電流増加の要因とならない材料を用いて低反射構造を実現する。 - 特許庁