To show clearly a relation between a film making speed determined by film making conditions such as a film making method, a temperature, a pressure, or a flow rate of material gas; and the optimum substrate off angle in which the highest quality film can be formed.例文帳に追加

成膜方法及び温度、圧力、原料ガス流量といった成膜条件によって決定される成膜速度と、最も高品質な膜が成膜できる最適な基板オフ角度との関係を明確に示すこと。 - 特許庁

To obtain in a simple and easy manner, optimum conditions of a control waveform and timing for improving the film thickness uniformity of a coated film with respect to nozzle discharge pressure and scanning speed in a spinless coating method.例文帳に追加

スピンレス塗布法におけるノズル吐出圧力および走査速度について塗布膜の膜厚均一性を向上させる制御波形およびタイミングの最適条件を簡便に求める。 - 特許庁

To solve the problem that optimum setting of gas discharge flow rate is difficult since a form of a spreading film at a peripheral edge is deteriorated even if drying time is long and it is short when coating liquid like resist liquid spread on a substrate is subjected to reduced pressure drying.例文帳に追加

基板に塗布されたレジスト液などの塗布液を減圧乾燥するにあたり、乾燥時間が長くても短くても周縁部の塗布膜の形状が悪化し、適切な排気流量の設定が難しい。 - 特許庁