Further, the apparatus has a low temperature processing chamber wherein the native oxide film is made to react with an NF3 gas at a low temperature and a heating chamber wherein the product film is heated, and the chambers are provided separately. また、低温で自然酸化膜にNF3を反応させる低温処理室207と生成膜を加熱する加熱室209とを別々に有している。 - 特許庁