熱分析・熱測定装置の英語

Ｘ線回折・熱分析同時測定装置例文帳に追加

X-RAY DIFFRACTION AND THERMAL ANALYSIS SIMULTANEOUS MEASUREMENT DEVICE - 特許庁

ＬＩＦ分析を簡単に高感度で測定でき、且つ光熱変換分光分析を同時且つ簡単に測定することができる蛍光分析用光合分波器、蛍光分析用光学モジュール、蛍光分析装置、蛍光・光熱変換分光分析装置、及び蛍光分析用チップを提供する。例文帳に追加

To provide an optical multiplexer/demultiplexer for fluorometric analysis capable of performing LIF (laser induced fluorescence) analysis simply and highly sensitively and performing photothermal spectral analysis simultaneously and simply, an optical module for the fluorometric analysis, a fluorometric analysis apparatus, a fluorescence/photothermal spectral analysis apparatus, and a chip for the fluorometric analysis. - 特許庁

被測定試料に対しＸ線を照射してＸ線回折測定を実施するとともに、当該被測定試料および標準試料を加熱して熱分析測定を同時に実施する機能を備えたＸ線回折・熱分析同時測定装置であり、被測定試料および標準試料を加熱する加熱炉を備えている。例文帳に追加

An X-ray diffraction and thermal analysis simultaneous measurement device includes functions for executing X-ray diffraction measurement by irradiating a sample for measurement with X-rays and simultaneously executing thermal analysis measurement by heating the sample for measurement and the standard sample, and includes a furnace heating which heats the sample for measurement and the standard sample. - 特許庁

液晶表示装置用カラーフィルタ１０において、着色層１２に含有する色素が、示差熱分析の昇温測定における７０〜１３０℃の範囲のピーク面積が色素１ｍｇあたり１Ｖ・ｓ以下であること。例文帳に追加

In the color filter 10 for liquid crystal display device, the dye included in the color layer 12 shows ≤1 V.s peak area per 1 mg of the dye in the range from 70 to 130°C in the temperature rising measurement by a differential thermal analysis. - 特許庁