「X diffraction」を含む例文一覧(1072)
＜前へ 1 2 3 4 5 6 7 8 9 10 11 .... 21 22 次へ＞- SAMPLE REPLACING MACHINE AND X-RAY DIFFRACTION DEVICE
試料交換機及びＸ線回折装置 - 特許庁 - AIRTIGHT SAMPLE HOLDER FOR X-RAY DIFFRACTION MEASUREMENT
Ｘ線回折測定用気密試料ホルダー - 特許庁 - STRESS HOLDING DEVICE AND X-RAY DIFFRACTION DEVICE
応力保持装置およびＸ線回折装置 - 特許庁 - X-RAY DIFFRACTION AND THERMAL ANALYSIS SIMULTANEOUS MEASUREMENT DEVICE
Ｘ線回折・熱分析同時測定装置 - 特許庁 - CALIBRATION METHOD OF ULTRA-PRECISE X-RAY DIFFRACTION APPARATUS
超精密Ｘ線回折装置の校正法 - 特許庁 - SAMPLE PRETREATMENT METHOD IN X-RAY DIFFRACTION
Ｘ線回折における試料前処理方法 - 特許庁 - DEVICE FOR OBSERVING BACK-REFLECTION X-RAY DIFFRACTION IMAGE
背面反射Ｘ線回折像観察装置 - 特許庁 - To provide an X-ray diffraction measuring method facilitating X-ray diffraction measurement in a transmission method.
透過法のＸ線回折測定を容易としうるＸ線回折測定方法の提供。 - 特許庁 - X-RAY ANALYZER FOR HAVING FLUORESCENCE AND DIFFRACTION FOR COMMON USE
蛍光・回折共用Ｘ線分析装置 - 特許庁 - SUPERCONDUCTING MAGNET UNIT FOR X-RAY DIFFRACTION APPARATUS
Ｘ線回折装置用超電導磁石装置 - 特許庁 - TRANSMISSION TYPE DIFFRACTION GRATING FOR X-RAY, X-RAY TALBOT INTERFEROMETER AND X-RAY IMAGING APPARATUS
Ｘ線用透過型回折格子、Ｘ線タルボ干渉計およびＸ線撮像装置 - 特許庁 - The gallium phthalocyanine compound has a diffraction peak at a Bragg angle of 26.4° to X-ray diffraction.
Ｘ線回折に対するブラッグ角２６．４度に回折ピークを有する。 - 特許庁 - X-RAY DIFFRACTION DEVICE, DATA ANALYSIS METHOD OF X-RAY DIFFRACTION DEVICE, CONTROL METHOD OF X-RAY DIFFRACTION DEVICE AND PROGRAM FOR IMPLEMENTING THE METHOD
Ｘ線回折装置、Ｘ線回折装置のデータ解析方法、Ｘ線回折装置の制御方法およびその方法を実現するためのプログラム - 特許庁 - Tungsten is not identified by X-ray diffraction, but the quantity is confirmed by the electro probe micro-analyser (EPMA).
WはX線回折には同定されず、EPMAにより量が確認できる。 - 特許庁 - The chemical compositions determined by X-ray diffraction are tabulated.
X線回折によって決定された化学組成が、表にまとめられている。 - 科学技術論文動詞集 - A measuring device 2 performs X-ray diffraction measurement.
測定装置２はＸ線回折測定を行う。 - 特許庁 - X-RAY DIFFRACTION MEASURING CONTAINER FOR THIN-FILM SAMPLE
薄膜状試料用Ｘ線回折測定容器 - 特許庁 - METHOD AND PROGRAM FOR MEASURING/ANALYZING X-RAY DIFFRACTION
Ｘ線回折測定解析方法及びプログラム - 特許庁 - A diffraction X-ray 5 diffraction at the sample 3 is measured in its intensity by an X-ray detector 6.
試料３で回折した回折Ｘ線５は、Ｘ線検出器６でその強度が測定される。 - 特許庁 - X-RAY DIFFRACTION MICROSCOPE APPARATUS AND X-RAY DIFFRACTION MEASURING METHOD BY THE SAME
Ｘ線回折顕微鏡装置およびＸ線回折顕微鏡装置によるＸ線回折測定方法 - 特許庁 - X-RAY DIFFRACTION MEASURING INSTRUMENT EQUIPPED WITH DEBYE-SCHERRER OPTICAL SYSTEM AND X-RAY DIFFRACTION MEASURING METHOD THEREFOR
デバイシェラー光学系を備えたＸ線回折測定装置とそのためのＸ線回折測定方法 - 特許庁 - MANUFACTURING METHOD FOR X-RAY PHASE TYPE DIFFRACTION GRATING AND AMPLITUDE TYPE DIFFRACTION GRATING USED FOR X-RAY TALBOT INTERFEROMETER
Ｘ線タルボ干渉計に用いられる位相型回折格子と振幅型回折格子の製造方法 - 特許庁 - CALIBRATION METHOD FOR TEMPERATURE IN X-RAY DIFFRACTION MEASUREMENT APPARATUS
Ｘ線回折測定装置の温度較正方法 - 特許庁 - METHOD FOR CONTROLLING SCATTERING ANGLE OF INCIDENCE X RAY IN X-RAY DIFFRACTION DEVICE
Ｘ線回折装置における入射Ｘ線の発散角制御方法 - 特許庁 - MICRO X-RAY DIFFRACTION MEASURING METHOD AND MICRO X- RAY DIFFRACTOMETER
微小部Ｘ線回折測定方法及び微小部Ｘ線回折装置 - 特許庁 - MICRO-PORTION X-RAY IRRADIATION DEVICE AND MICRO-PORTION X-RAY IRRADIATION METHOD OF X-RAY DIFFRACTION DEVICE
Ｘ線回折装置の微小部Ｘ線照射装置及び微小部Ｘ線照射方法 - 特許庁 - The sample for X-ray diffraction measurement is analyzed by an X-ray diffraction device, to thereby measure the asbestos content.
このＸ線回折測定用試料をＸ線回折装置で分析しアスベスト含有量を測定する。 - 特許庁 - METHOD AND APPARATUS FOR CONTROLLING X-RAY DIFFRACTION INSTRUMENT
Ｘ線回折装置の制御方法及び制御装置 - 特許庁 - METHOD OF DYNAMICALLY DISPLAYING SCATTERING VECTOR OF X-RAY DIFFRACTION
Ｘ線回折の散乱ベクトルの動的表示方法 - 特許庁 - SAMPLE STAND-EXCHANGING DEVICE IN X-RAY DIFFRACTION APPARATUS
Ｘ線回折装置における試料台交換装置 - 特許庁 - The instrument with function of both the X-ray diffraction (XRD) and the X-ray fluorescence (XRF) measurement deploys an X-ray source 10 generating the incident X-ray beam aiming at samples on a sample stand.
X線回折XRDおよびX線蛍光測定XRFの両方の機能をもつ機器が、試料台上の試料に向けられる入射X線ビームを生成するX線源１０を配置している。 - 特許庁 - The X-ray diffraction intensity of the composite material by CuKα is represented by expression (1): I_1/I_2≤2 (1), wherein I_1 is the peak diffraction intensity at 2θ=5.5-6.5°; and I_2 is the peak diffraction intensity at 2θ=5.5-6.5°.
ここで、I_1:２θ＝5.5〜6.5°間のヒ゜ーク回折強度、I_2:２θ＝5.5〜6.5°間のヒ゜ーク回折強度である。 - 特許庁 - PARALLEL X-RAY BEAM EXTRACTING METHOD AND APPARATUS, AND X-RAY DIFFRACTION SYSTEM
平行Ｘ線ビームの取り出し方法及び装置並びにＸ線回折装置 - 特許庁 - The eyeglasses lens 1 is provided with a diffraction structure 4 having different pitches in an astigmatic axis X and an intersection axis Y orthogonal to the astigmatic axis X.
乱視軸Xと、乱視軸Xと直交する交差軸Yとでピッチが異なる回折構造４を眼鏡レンズ１に設けた。 - 特許庁 - When calculating them, vector compensation is applied on X-ray diffraction intensity of each diffraction peak.
算出に際しては、各回折ピークのＸ線回折強度についてベクトル補正を行う。 - 特許庁 - PROCESSING METHOD OF TWO-DIMENSIONAL X-RAY DETECTION DATA, TWO-DIMENSIONAL X-RAY DETECTION DEVICE, AND X-RAY DIFFRACTION DEVICE
二次元Ｘ線検出データの処理方法、二次元Ｘ線検出装置、およびＸ線回折装置 - 特許庁 - To provide manufacturing methods for an X-ray phase type diffraction grating and an X-ray amplitude type diffraction grating used for an X-ray Talbot interferometer.
Ｘ線タルボ干渉計に用いられるＸ線位相型回折格子及びＸ線振幅型回折格子の製造方法を提案する。 - 特許庁 - When the integrated intensity of X-ray diffraction of a (220) plane on the inner surface of the electrode is I(220) and the integrated intensity of X-ray diffraction of a (111) plane is I(111), the electrode satisfies I(220)/I(111)≥0.41.
この電極の内面における(220)面のX線回折の積分強度をI(220)、(111)面のX線回折の積分強度をI(111)とするとき、この電極は、I(220)/I(111)≧0.41を満たす。 - 特許庁 - METHOD AND APPARATUS FOR HIGHLY ACCURATE X-RAY DIFFRACTION USING LOW-PHOTON-DENSITY X-RAYS
低フォトン密度Ｘ線を使用する高精度Ｘ線回折方法及び装置 - 特許庁 - REFLECTION TYPE DIFFRACTION GRATING HOLOGRAM AND X-RAY CONVERGING SYSTEM
反射型回折格子ホログラム及びＸ線集光システム - 特許庁 - ISOTROPIC HIGH-PRESSURE APPLYING DEVICE FOR X-RAY DIFFRACTION ANALYSIS
Ｘ線回折解析用等方性高圧力印加装置 - 特許庁 - Each of the new forms is differentiated by a unique powder X-ray diffraction pattern.
この新たな結晶形の各々は特異な粉末X線回折パターンにより識別する。 - 特許庁 - To provide an X-ray diffraction device excellent in angle resolving power, reduced in the lowering of X-ray intensity and simplified in its structure in an X-ray diffraction method using a parallel beam method, and the X-ray diffraction method.
平行ビーム法を用いたＸ線回折法において、角度分解能が優れていて、Ｘ線強度の低下が少なく、構造が簡素化されたＸ線回折装置およびＸ線回折方法を提供する。 - 特許庁 - When the surface layer is subjected to X-ray diffraction, a diffraction peak corresponding to a (111) crystal plane is observed.
表層のＸ線回折により、（１１１）結晶面に対応した回折ピークが観察される。 - 特許庁 - INSTRUMENT AND METHOD FOR MEASURING X-RAY DIFFRACTION
Ｘ線回折測定装置およびＸ線回折測定方法 - 特許庁 - X-RAY DIFFRACTION MEASURING INSTRUMENT AND METHOD THEREFOR
Ｘ線回折測定装置およびＸ線回折測定方法 - 特許庁 - MEASUREMENT OF CRITICAL DIMENSIONS USING X-RAY DIFFRACTION IN REFLECTION MODE
反射モードのＸ線回折を用いた限界寸法の測定 - 特許庁 - DIFFRACTION GRATING FOR X-RAY INTERFEROMETER AND MANUFACTURING METHOD THEREOF
Ｘ線干渉計用の回折格子及びその製造方法 - 特許庁 - SAMPLE HOLDING DEVICE AND X-RAY DIFFRACTION APPARATUS USING DEVICE
試料保持装置および同装置を用いたＸ線回折装置 - 特許庁 - METHOD AND APPARATUS FOR X-RAY DIFFRACTION IMAGE CONTRAST BY MICROBALLOONS
マイクロバルーンによるＸ線回折造影方法および同装置 - 特許庁
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