あらいその５ちょうめの英語

ウエハ５上のフォトレジスト膜を感光させない２波長以上の連続スペクトル光を照明光源８から縮小投影レンズ３を介してアライメントマークに照射し、そのアライメントマークからの反射光を反射鏡１８で縮小投影レンズ系の外部に取り出し、色収差補正レンズ１６により色収差の補正を行う。例文帳に追加

An alignment mark is irradiated through a reduction projecting lens 3 with continuous spectrum lights in two or more wavelength for preventing a photoresist film on a wafer 5 from being sensitized from an illuminating light source 8, and reflected lights from the alignment mark are extracted to the outside part of the reduction projecting lens system by a reflecting mirror 18, and chromatic aberration is corrected by a chromatic aberration correcting lens 16. - 特許庁