thermal equilibrium processとは 意味・読み方・使い方

Between a process where the substrate is placed on the movable member and the drawing process S2, a process (S1) where a mask member comprising the resist film and the X-ray absorber film and the substrate is so held for the same condition as a thermal equilibrium in the drawing process is performed.例文帳に追加

基板を可動部材の上に載せる工程と描画工程（Ｓ２）との間で、描画工程における熱的平衡状態とほぼ同一の状態となるように、レジスト膜とＸ線吸収体膜と基板とを含むマスク部材を保持する工程（Ｓ１）を実施する。 - 特許庁