atmospheric lapse rateとは 意味・読み方・使い方

The method of electron beam lithography which performs the lithography at a sample with an electron beam includes the steps of sequentially measuring an atmospheric difference from the atmospheric pressure measured at the previous lithographic calibration time and a lapse time from the previous lithographic calibration time, and performing the calibration of the lithographic accuracy when the proportion of the atmospheric pressure difference to the lapse time is an atmospheric pressure change rate specified value or more.例文帳に追加

電子ビームにより試料に描画を行う電子線描画方法において、前回描画較正時に計測された気圧との気圧差および前回描画較正時からの経過時間を逐次計測し、前記経過時間に対する前記気圧差の割合が、気圧変動割合規定値以上のときには、描画精度の較正を実行することを特徴とする。 - 特許庁