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感受性化処理方法及びそれを用いた無電解めっき皮膜の形成方法例文帳に追加

SENSITIZING METHOD AND METHOD FOR FORMING ELECTROLESS PLATING FILM USING THE SAME - 特許庁

第２に、ガラス基板上に無電解ニッケルめっきを行う際、脱脂処理、感受性化及び触媒活性化処理後、錯化剤としてカルボン酸類を用いた無電解ニッケルめっき浴中で無電解ニッケルめっきを行う。例文帳に追加

Next, a method for electroless-nickel-plating the glass substrate comprises degreasing, sensitizing and catalysis-activating the glass substrate; and then electroless-nickel-plating it in an electroless nickel plating bath containing a carboxylic acid as a complexing agent. - 特許庁

第１に、ガラス基板上に無電解銅めっきを行う際、脱脂処理、感受性化処理及び触媒活性化処理した後、ポリエチレングリコールを０．１〜１５ｇ／Ｌ含有する無電解銅めっき浴中で無電解銅めっきを行う。例文帳に追加

First, a method for electroless-copper-plating the glass substrate comprises degreasing, sensitizing and catalysis-activating the glass substrate; and then electroless-copper-plating it in an electroless copper plating bath containing 0.1 to 15 g/L polyethylene glycol. - 特許庁

簡単かつ安価に、不活性素材上に無電解めっき皮膜を形成できる感受性化処理方法及びそれを用いた無電解めっき皮膜の形成方法を提供すること。例文帳に追加

To provide a sensitizing method where an electroless plating film can be easily and inexpensively formed on an inert stock, and to provide a method for forming an electroless plating film using the same. - 特許庁

本処理では、現像処理後の原盤に図４のフロー図に示す導電性被膜形成処理に従って原盤表面親水化処理、感受性化処理、第１の活性化処理、第２の活性化処理、無電解酸化亜鉛めっき処理、無電解ニッケルめっき処理を順に行うことにより原盤３の情報パタン面側にニッケルの導電皮膜を形成する。例文帳に追加

In this treatment, the developed original disk is subjected to original disk surface hydrophilic treatment, susceptibility treatment, a first activation treatment, a second activation treatment, nonelectrolytic zinc oxide plating treatment and nonelectrolytic nickel plating treatment according to the conductive coating film formation treatment to form a conductive coating film of nickel on an information pattern surface side of the original disk 3. - 特許庁