皮膜成長速度の英語

基板材料の制約がなく、基板温度の制御が容易にでき、薄膜形成速度を増大させながらエネルギー効率がよく、皮膜性能の安定化が可能な触媒化学気相成長方法および触媒化学気相成長装置を提供する。例文帳に追加

To provide a catalytic chemical vapor deposition method and a catalytic chemical vapor deposition device in which the control of a substrate temperature can easily be performed without the limitation of substrate materials, the efficiency of energy is high while increasing a thin film deposition rate, and the stabilization of film performance is possible. - 特許庁

電気抵抗率100Ω以下の導電性基板上に堆積したAlを90%以上含有する金属膜もしくはTiを90%以上含有する金属膜のみを溶液中に露出させ陽極とし、陰極となす角を5度以下とすることで、陽極酸化皮膜の面内の成長速度を均一にした。例文帳に追加

Only a metal film comprising ≥90% Al or a metal film comprising ≥90% Ti deposited on an electrically conductive substrate having an electric resistivity of ≤100 Ω is exposed to a solution, so as to be an anode, and its angle formed with a cathode is controlled to ≤5°, thus the growth rate in the plane of an anodized film is made uniform. - 特許庁