alkaline resolution methodとは 意味・読み方・使い方

To provide an alkaline development type photosensitive resin composition that enables the formation of a pattern with good resolution upon development with an aqueous alkaline solution without adding a dissolution inhibitor and a method for forming a pattern using the alkaline development type photosensitive resin composition.例文帳に追加

溶解阻害剤を添加することなく、アルカリ水溶液現像によって解像度の良好なパターンを形成することを可能にするアルカリ現像型感光性樹脂組成物及びそれを用いたパターン形成方法。 - 特許庁

To provide a method of manufacturing a photo-sensitive polyimide precursor which is capable of high sensitivity, high resolution pattern formation with alkaline developing solution.例文帳に追加

アルカリ現像液による高感度・高解像度のパターン形成が可能な感光性ポリイミド前駆体の製造方法を提供する。 - 特許庁

To provide a heat-resistant negative photosensitive resin composition also having good sensitivity and resolution, a pattern forming method using the composition in which the composition is developable with an alkaline aqueous solution and excels in sensitivity, resolution and heat resistance and by which a pattern of a good shape is obtained, and to provide high-reliability electronic components.例文帳に追加

感度や解像度も良好な耐熱性ネガ型感光性樹脂組成物、これを用いたアルカリ水溶液で現像可能で、感度、解像度及び耐熱性に優れ、良好な形状のパターンが得られるパターン形成方法、及び信頼性の高い電子部品を提供する。 - 特許庁

To provide a method for producing a positive photosensitive resin composition which is developed with an alkaline aqueous solution in a short time, is produced in commercial production facilities, and forms a pattern having high resolution and high film thickness retention.例文帳に追加

アルカリ水溶液による短時間での現像が可能であり、量産設備で製造が可能で、かつ高解像度で膜厚保持率の高いパターンを形成できるポジ型感光性樹脂組成物の製造方法を提供すること。 - 特許庁

To provide a photosensitive resin composition which is excellent in sensitivity, resolution and adhesion and can be developed with an alkaline aqueous solution, to provided a photosensitive resin laminate that uses photosensitive resin composition, and to provide a method for forming a resist pattern on a substrate using the photosensitive resin laminate.例文帳に追加

感度、解像度、及び密着性に優れ、アルカリ性水溶液によって現像しうる感光性樹脂組成物、該感光性樹脂組成物を用いた感光性樹脂積層体、該感光性樹脂積層体を用いて基板上にレジストパターンを形成する方法を提供すること。 - 特許庁

To provide a positive photosensitive polyamideimide resin composition excellent in sensitivity, resolution, adhesion in development and heat resistance, capable of being developed with an alkaline aqueous solution, and giving a pattern of a good profile, a method for producing a pattern and electronic components.例文帳に追加

感度、解像度、現像時の密着性、及び耐熱性に優れ、良好な形状のパターンが得られるると共に、アルカリ水溶液で現像が可能なポジ型感光性ポリアミドイミド樹脂組成物、パターンの製造方法及び電子部品を提供する。 - 特許庁

To provide a positive photosensitive polyamideimide resin composition which excels in sensitivity, resolution, adhesion in development, and heat resistance, can be exposed with an i-line and developed with an alkaline aqueous solution, and yields a pattern of a good profile, a method for producing a pattern and an electronic component.例文帳に追加

感度、解像度、現像時の密着性、及び耐熱性に優れ、良好な形状のパターンが得られるると共に、ｉ線で露光が可能で、アルカリ水溶液で現像が可能なポジ型感光性ポリアミドイミド樹脂組成物、パターンの製造方法及び電子部品を提供する。 - 特許庁