be polishedとは 意味・読み方・使い方

POLISHING BACK SHEET AND OBJECT TO BE POLISHED FIXING METHOD例文帳に追加

研磨用バックシート及び被研磨物固定方法 - 特許庁

A method is provided that a work (a substance to be polished) having at least one surface being a surface to be polished (a surface to be ground) and provide at the periphery of the central part of the surface to be polished with a through-gap is polished by using granular media.例文帳に追加

少なくとも一面が被研摩面（被研削面）とされ、該被研摩面の中心部の周囲には貫通空隙を備えたワーク（被研摩物）を粒状メディアを用いて研摩（研削）する方法。 - 特許庁

To provide a polishing device and a polishing method for making uniform distribution of pressure in the process of polishing on the surface to be polished of an object to be polished so that the whole surface of the surface to be polished can be uniformly polished.例文帳に追加

被研磨対象物の被研磨面における研磨中の圧力分布を均一化し、被研磨面全面において均一に研磨可能な研磨装置および研磨方法を提供する。 - 特許庁

METHOD FOR CREATING FIXED SAMPLE TO BE POLISHED例文帳に追加

試料が固定された被研磨体の作成方法 - 特許庁

POLISHING PAD AND METHOD FOR POLISHING OBJECT TO BE POLISHED例文帳に追加

研磨用パッド及び被研磨物の研磨方法 - 特許庁

A friction force is generated between the buff cloth B and surface of the sample 11 to be polished, and thus the surface to be polished is polished by the buff cloth B.例文帳に追加

バフ布Ｂ及び供試材１１の被研磨面間に摩擦力が生じ、これにより該被研磨面はバフ布Ｂによって研磨される。 - 特許庁

A polishing liquid is supplied between the object 78 to be polished and the polishing pad 20, and the object 78 to be polished is polished while applying pressure onto the object 78 to be polished by the holding surface plate 71 and the polishing surface plate 72.例文帳に追加

被研磨物７８および研磨パッド２０間に研磨液を供給し、保持定盤７１、研磨定盤７２で被研磨物７８に圧力をかけながら被研磨物７８を研磨加工する。 - 特許庁

To provide a polishing method by which a surface to be polished can be polished partially and can be cleaned directly by directly monitoring the polished state of the surface.例文帳に追加

被研磨面を局所的に研磨可能であり、被研磨面の研磨状態を直接モニターし、被研磨面を直接洗浄することができる研磨方法を提供する。 - 特許庁