drying behaviorとは 意味・読み方・使い方

COATED FILM DRYING BEHAVIOR MEASURING METHOD AND INSTRUMENT例文帳に追加

塗膜乾燥挙動測定方法及び装置 - 特許庁

To provide a device by which drying behavior is strictly observed, by easily preventing occurrence of unevenness in film thickness on an applied surface and irregularity in the drying behavior on the applied surface, by providing a heating stage having an applying mechanism, and to provide an analyzing method using the same.例文帳に追加

塗布機構を有する加熱ステージを提供することによって、簡便に塗布面に膜厚ムラや塗布面内での乾燥挙動にムラの発生を防止し、厳密に乾燥挙動を観察することが可能となる装置、及びその解析方法を提供する。 - 特許庁

To suppress dynamic behavior while preventing drying of the surface of a sample by precisely spraying liquid in only the vicinity of an observation area without dispersing it to an objective lens and its periphery.例文帳に追加

液体を対物レンズや周辺に飛散させることなく観察範囲の近傍のみに正確に散布して試料の表面の乾燥を防止しつつ動的挙動を抑制する。 - 特許庁

To provide a getter composition containing a drying agent having stability in an ordinary temperature/humidity environment, having stability of rheological behavior, and capable of being used for screen process printing.例文帳に追加

通常の温／湿度環境下における安定性を有する乾燥剤を含み、およびレオロジー的挙動安定性を有するスクリーン印刷可能なゲッター組成物の提供。 - 特許庁

To obtain a resin composition for paint capable of forming a coating film excellent in finishing behavior, antifouling property and resistance to cracking of a coated film even in a clear coating film for cold drying use.例文帳に追加

常温乾燥用途のクリヤ−塗膜においても、仕上り性、耐汚染性及び塗膜の耐ワレ性の優れた塗膜を形成することができる塗料用樹脂組成物を提供すること。 - 特許庁

To achieve the rationalization of a gathering state in a bonding process, the stabilization of feed in a feed process, etc. by achieving not only the elimination or sharp reduction of violent behavior but also the induction and re-occurrence of bending only on an intentional surface side in the shrink strain developed in veneer accompanied by drying.例文帳に追加

乾燥に伴ってベニヤ単板に顕在化する収縮歪の内で、あばれについては解消乃至大幅に減少させ、曲がりについては意図した面側のみに誘導再発生させることにより、接着工程に於ける集合姿勢の適正化、搬送工程に於ける搬送の安定化等を図る。 - 特許庁

A board formed with a liquid film by a resist liquid is set within an accommodating space in a drying treatment portion of a board treatment apparatus, the space is sealed and pressure is reduced for lower predetermined pressure PS than the saturated vapor pressure PV of the resist liquid, while a pressure behavior is being monitored.例文帳に追加

レジスト液により液膜を形成した基板を基板処理装置の乾燥処理部に備わる収容空間内に載置して、該空間を密閉し、圧力挙動をモニタしつつ、レジスト液の飽和蒸気圧ＰＶよりも低い設定圧力ＰＳを目指して減圧する。 - 特許庁