mechanical cleaning methodとは 意味・読み方・使い方

To provide a method and apparatus for cleaning and polishing a substrate after being subjected to chemical mechanical polishing.例文帳に追加

化学的機械研磨後に基板を洗浄および研磨する方法と装置を提供すること。 - 特許庁

To provide a cleaning solution compounding device and a cleaning solution supply method in a CMP (chemical-mechanical polishing) apparatus for stabilizing the concentration and flow rate of a cleaning solution supplied to a cleaner.例文帳に追加

ＣＭＰ装置の洗浄機に供給される洗浄液の濃度と流量を安定させるＣＭＰ装置における洗浄液調合装置及び洗浄液供給方法を提供する。 - 特許庁

To provide a gas cleaning agent which is inexpensive, exhibits high performance when impurities are removed and has constant mechanical strength and to provide a method for manufacturing the gas cleaning agent.例文帳に追加

低コストで、高い不純物除去性能を有し、かつ、一定の機械的強度を有するガス浄化剤およびその製造方法の提供。 - 特許庁

To provide a self-cleaning surface having such a surface structure that is active regardless of suffering from natural corrosion, exhibits self- cleaning activity brought about by water, and has high mechanical stability and to provide a method for simply producing the self-cleaning surface.例文帳に追加

天然の侵食によっても活動する水による自浄性を示す高い機械的安定性を有する表面構造の作成並びにこのような自浄性表面の簡単な製造方法。 - 特許庁

By using a pad cleaning brush and a method of manufacturing the pad cleaning brush together with spraying rinsing water, a polishing pad of a chemical mechanical polishing apparatus is thoroughly cleaned after a wafer has been polished.例文帳に追加

パッド洗浄ブラシおよびその製造方法をスプレーリンス水と共に用いて、ウェーハの研磨後にケミカルメカニカルポリシング装置のポリシングパッドを徹底的に洗浄する。 - 特許庁

The method for removing the oxidized layer is performed by a chemical polishing method such as a metallic surface cleaning method and a metallic surface gloss dipping method, or a mechanical polishing method such as a buffing method, a belt polishing method, a sand paper polishing method and a wire brushing method.例文帳に追加

酸化層の除去方法は、金属表面清浄法、金属表面光沢浸漬法等の化学的研磨法、あるいはバフ研磨法、ベルト研磨法、サンドペーパー研磨法、ワイヤーブラシ研磨法等の機械的研磨法のいずれかによってなされる。 - 特許庁

To provide a method for supplementing ultrasonic mechanical cleaning, focused on chemical decontamination of an irradiated nuclear fuel assembly.例文帳に追加

照射核燃料集合体の化学的な除染に焦点を合せて超音波の機械的な洗浄を補う方法を提供する。 - 特許庁

The cleaning method of the substrate for the semiconductor device comprises the step of cleaning the substrate for the semiconductor device after chemical mechanical polishing treatment which is provided with a Cu film and a low dielectric constant insulating film on a surface thereof, by using this cleaning liquid for the substrate for the semiconductor device.例文帳に追加

この半導体デバイス用基板洗浄液を用いて、表面にＣｕ膜と低誘電率絶縁膜とを有し、かつ、ＣＭＰ処理後の半導体デバイス用基板を洗浄する半導体デバイス用基板の洗浄方法。 - 特許庁