極端紫外域の英語

露光装置は、極端紫外域の露光光で基板を露光する。例文帳に追加

The exposure apparatus exposes the substrate with exposure light in an extreme ultraviolet range. - 特許庁

光学装置は、極端紫外域の電磁波を反射可能な多層膜反射鏡を複数備えている。例文帳に追加

The optical device has a plurality of multilayer film reflecting mirrors capable of reflecting electromagnetic waves at an extreme ultraviolet region. - 特許庁

極端紫外光または軟Ｘ線領域の短波長光光源装置および極端紫外光または軟Ｘ線領域の短波長光発生方法例文帳に追加

SHORT WAVELENGTH LIGHT SOURCE DEVICE OF EXTREME ULTRAVIOLET LIGHT OR SOFT X-RAY RANGE, AND METHOD FOR GENERATING SHORT WAVELENGTH LIGHT OF EXTREME ULTRAVIOLET LIGHT OR SOFT X-RAY RANGE - 特許庁

また、本発明を、放電領域外に配置された極端紫外光放射種にレーザビームを照射し、発生したプラズマを放電領域に供給して、極端紫外光（ＥＵＶ）を発生させるＥＵＶ光源装置にも適用でき、プラズマを高い密度を維持した状態で放電領域に供給することができる。例文帳に追加

Furthermore, a plasma generation method can be applied to an extreme ultraviolet light source device for generating extreme ultraviolet light (EUV) while the laser beam is irradiated to an extreme ultraviolet light emissive species arranged outside a discharge zone and the generated plasma is supplied to the discharge zone, and the plasma can be supplied to the discharge zone while it maintains the high density. - 特許庁

複数の前記多層膜反射鏡は、前記電磁波の光路に沿ってそれぞれ配置され、少なくとも２つの前記多層膜反射鏡の前記極端紫外域以外の波長域における反射波長特性が相互に異なる。例文帳に追加

The plurality of multilayer film reflecting mirrors are arranged along the optical path of electromagnetic waves, and reflection wavelength characteristics differ at a wavelength region other than the extreme ultraviolet region in at least two multilayer film reflecting mirrors. - 特許庁

回転する電極の回転速度を速くすることなく、高い繰り返し周波数で、安定してスズを放電領域に供給し、ＥＵＶの安定した発光が可能な極端紫外光光源装置を提供する。例文帳に追加

To provide an extreme ultraviolet light source device capable of stably supplying tin to a discharge region with high repetition frequency and of achieving stable light emission of EUV without increasing the rotating speed of a rotating electrode. - 特許庁

放電ガスは放電空間１３１の光軸方向のぼぼ全域に亘って高い圧力で均一な分布し、また初期ガス圧の値自体も高くできるため、変換効率が向上し、極端紫外光の出力も大きくなる。例文帳に追加

Since the discharge gas is uniformly distributed, covering the almost the whole region at a high pressure, extending in the of the optical axis of the discharge space 131 and the value of an initial gas-pressure can be made high, the conversion efficiency is improved and the output power of the extreme-ultraviolet light also becomes large. - 特許庁