常温・常圧で気体状態のガスを高温高圧下で絶縁材料に溶解させた後、１〜１００ＭＰａ／Ｈｒの減圧速度で溶解時の圧力より低い雰囲気にさらして微小な空隙を発生する工程を備えている絶縁材料の製造方法。例文帳に追加

In the manufacturing method of the insulating material, a process for dissolving gas in a gaseous state at an ordinary temperature and ordinary pressure into the insulating material at a high temperature and high pressure, for exposing it to an atmosphere lower than pressure in the dissolution at the reducing speed of 1 to 100 MPa/Hr, and for generating a micro gap is installed. - 特許庁

電子デバイスの絶縁材料や光学材料として優れた性能を有するフッ素添加酸化ケイ素膜を、外部から気体を導入することなく、室温で任意の基板上に形成可能とする。例文帳に追加

To form a fluorine-added silicon oxide film having excellent performance as an insulating material and an optical material for an electronic device on an optional substrate at room temperature without introducing gas from the outside. - 特許庁

絶縁体用樹脂と空隙を有する最大粒径１０００ｎｍの微細粒子とから構成されるワニスと気体とから、該ワニス構成分子間と気体分子とを剪断、振動、衝突、及びキャビテーション状態を生じさせることにより、微小気泡を発生、均一分散させて得られる絶縁材料において、微小気泡が最大孔径１００００ｎｍで、且つ含有率が、微細粒子の空隙と合せて１０容積％以上８０容積％以下で、均一分散させて成ることを特徴とする絶縁材料。例文帳に追加

This insulating material having homogeneously dispersed micro bubbles having maximum bore diameter of 10,000 nm and rate of content of 10 to 80 vol.% including gaps of micro particles, is obtained from a gas and a varnish comprising a resin for insulation and micro particles of maximum particle size of 1,000 nm and having gaps by producing shear, vibration, collision and cavitation state to generate micro bubbles and disperse homogeneously. - 特許庁

気体が導入される導入口１１ｂと導入口１１ｂとは別に設けられた取付穴１１ａとが開口したキャップ１１並びに絶縁材料からなり取付穴１１ａに圧入されて取付穴１１ａを閉塞するベース１２からなりセンサ素子２が収納されたケース１を備える。例文帳に追加

This gas sensor is equipped with a case 1 comprising the cap 11 where an introduction port 11b for introducing gas and a mounting hole 11a provided separately from the introduction port 11b are opened, and the base 12 comprising an insulating material and blocking the mounting hole 11a by being pressed into the mounting hole 11a, and storing a sensor element 2. - 特許庁