film over withとは 意味・読み方・使い方

The oxide film 12 may also be irradiated with the laser beam E over a coating film formed on the film 12.例文帳に追加

また、酸化膜１２の上に被覆膜を形成してその上からエキシマレーザビームＥを照射するようにしてもよい。 - 特許庁

Then, an insulating film 9 is made over the entire surface, and next planarizing is performed, with the stopper film 4 as a polishing deterring film in chemical and mechanical polishing.例文帳に追加

その後、全面に絶縁膜９を形成し、次いでストッパー膜４を化学的機械的研磨の研磨阻止膜として用いて平坦化を行う。 - 特許庁

An interlayer insulation film 14 is formed with a recessed section 15, and then the multiplayer film 16 is formed over the film 14 which includes the recessed section 15.例文帳に追加

層間絶縁膜１４に凹所１５が形成され、この凹所１５の内外に多層膜１６が形成される。 - 特許庁

To provide a method and a device for efficiently predicting dielectric breakdown over aging (TDDB) over a wide region with fewer number of insulating film samples.例文帳に追加

広領域の経時絶縁破壊特性（ＴＤＤＢ）を、より少ない絶縁膜試料数で効率的に予測する方法及び装置を提供すること。 - 特許庁

The semiconductor device includes: a first island-like reinforcement film over a substrate having flexibility; a semiconductor film including a channel formation region and an impurity region over the first island-like reinforcement film; a first conductive film over the channel formation region with a gate insulating film interposed therebetween; and a second island-like reinforcement film covering the first conductive film and the gate insulating film.例文帳に追加

可撓性を有する基板上に設けられた第１の島状の補強膜と、第１の島状の補強膜上に、チャネル形成領域と不純物領域とを具備する半導体膜と、チャネル形成領域の上方にゲート絶縁膜を介して設けられた第１の導電膜と、第１の導電膜及びゲート絶縁膜を覆って設けられた第２の島状の補強膜とを有している。 - 特許庁

Uramaki is made through the process of spreading vinegared rice over dried seaweed put on makisu, placing fillings on vinegared rice, covering it with plastic film, and rolling it.発音を聞く 例文帳に追加

巻き簾の上に敷いた海苔の上に全面に酢飯、具を載せ、ラップをかぶせ巻く。 - Wikipedia日英京都関連文書対訳コーパス

The gate wiring is covered with a polyimide membrane and the metal film extends over the polyimide membrane.例文帳に追加

ゲート配線はポリイミド膜に覆われ、金属膜はポリイミド膜の上まで延在する。 - 特許庁

The silicon oxide film is deposited over the substrate with a halogen concentration less than 1.0%.例文帳に追加

酸化シリコン膜が、１.０％未満のハロゲン濃度で基板の上に堆積される。 - 特許庁