relative concentrationとは 意味・読み方・使い方

The concentration is converted to a relative fuel concentration FGPG2 (1108).例文帳に追加

そして、それを相対燃料濃度ＦＧＰＧ２に換算する（１１０８）。 - 特許庁

The relative concentration of hydrogen becomes 0.4 or higher against relative concentration 2.0 at the mask end if the width of opening part is 2 μm, to cause etching, however no etching occurs because relative concentration of hydrogen is less than 0.4 against relative concentration of 0.5 and 1.0 at the mask end.例文帳に追加

開口部幅が２μｍのときはマスク端での相対濃度が２．０に水素の相対濃度が０．４以上になりエッチングが生じ、マスク端での相対濃度が０．５、１．０に対して水素の相対濃度が０．４未満になりエッチングが生じない。 - 特許庁

If the width of opening part is 1.5 μm, the relative concentration of hydrogen becomes 0.4 or higher against relative concentration of 1.0 and 2.0 at the mask end, to cause etching, but no etching occurs when the relative concentration of hydrogen becomes less than 0.4 against relative concentration of 0.5 at the mask end.例文帳に追加

開口部幅が１．５μｍのときはマスク端での相対濃度が１．０と２．０に対して水素の相対濃度が０．４以上になりエッチングが生じ、マスク端での相対濃度が０．５に対して水素の相対濃度が０．４未満になりエッチングが生じない。 - 特許庁

The moisture concentration of gas in the melt furnace 1 is measured, and the concentration of fluoroketone in the cover gas is adjusted to a range from 1/50-1/5 relative to the moisture concentration.例文帳に追加

溶解炉１内の雰囲気中の水分濃度を求め、カバーガス中のフロロケトン濃度をこの水分濃度の１／５０〜１／５とする。 - 特許庁

If the relative concentration of hydrogen at which progression of etching appears is assumed to be about 0.4, the etching occurs because the relative concentration of hydrogen becomes 0.4 or higher when the width of opening part is 1 μm against each of relative concentration 0.5, 1.0, and 2.0 at a mask end.例文帳に追加

エッチングの進行が発現する水素の相対濃度を０．４程度とすると、マスク端での相対濃度が０．５、１．０、２．０それぞれに対して、開口部幅が１μｍのときは水素の相対濃度が０．４以上になるのでエッチングが生じる。 - 特許庁

The betulinic acid is dissolved in N-methylpyrrolidone (NMP) at a concentration of 28.5 wt.% or lower relative to the same, in dimethylsulfoxide (DMSO) at a concentration of 20.0 wt.% or lower relative to the same, or in crotamiton at a concentration of 7.4 wt.% or lower relative to the same.例文帳に追加

ベツリン酸をＮ−メチルピロリドン（ＮＭＰ）に対して２８．５ｗｔ％以下の濃度、ジメチルスルホキシド（ＤＭＳＯ）に対して２０．０ｗｔ％以下の濃度、またはクロタミトンに対して７．４ｗｔ％以下の濃度に溶解する。 - 特許庁

The generating means makes a noted pixel binary based on the relative concentration differences between it and surrounding pixels.例文帳に追加

生成手段は、周囲ピクセルとの相対的な濃度差に基づいて注目ピクセルを２値化する。 - 特許庁