exposure tableとは 意味・読み方・使い方

As for the classification of specific target organ/systemic toxicity (single exposure and repeated exposure), the “guidance values” which are used for categorization based on animal data are shown in Table 3.8.1, Table 3.9.1 and Table 3.9.2, and all of them are in units of mg/l for vapor inhalation.例文帳に追加

しかし、急性毒性用の表 3.1.1.のような蒸気吸入に関する注記はなされておらず、GHS 文書本文にも記載はない。 - 経済産業省

- Reference table in case of the allowable exposure concentration of 3×10-4mg/m3 -例文帳に追加

－許容される濃度を3×10-4mg/m3とした時の選定目安表－ - 厚生労働省

SEALING MEMBER AND SEALING METHOD, TABLE AND STAGE DEVICE, AS WELL AS EXPOSURE DEVICE例文帳に追加

シール部材及びシール方法、テーブル及びステージ装置、並びに露光装置 - 特許庁

Therefore, in this project, regarding specific target organ/systemic toxicity (single exposure and repeated exposure), the toxicity manifestation concentration at the time of vapor inhalation is investigated in mg/l, and is evaluated by comparing it with the value shown in the Table. If the original data is given in ppm, the unit is converted into mg/l and a comparison is made.例文帳に追加

原資料の記載が ppm であれば単位を mg/l に変換し比較する。 - 経済産業省

After the exposure operation is over, the substrate is lifted and isolated from the substrate table.例文帳に追加

露光動作が終了したら、基板を持ち上げて、基板テーブルから離す。 - 特許庁

METHOD FOR PREPARING TRANSFORMATION TABLE, EXPOSURE DEVICE EQUIPPED WITH TRANSFORMATION TABLE PREPARED BASED ON THE SAME METHOD AND PHOTOGRAPHIC PROCESSING DEVICE EQUIPPED WITH EXPOSURE DEVICE例文帳に追加

変換テーブルの作成方法、この方法に基づいて作成された変換テーブルを備える露光装置及び露光装置を備える写真処理装置 - 特許庁

An exposure table 1 for exposure device is used in an exposure device, and the work carried by a carrying means is placed on the exposure table 1, and the face on which a work W is to be placed of this exposure table is subjected to surface treatment 2 with a fluororesin by which the work is easily released from the face.例文帳に追加

露光装置で使用され、搬送手段により搬送されて来るワークを載置する露光装置用露光テーブル１において、前記露光装置用露光テーブルは、そのワークＷとの載置面に、前記ワークとの離脱が容易となるフッ素樹脂で表面処理加工２を施した露光装置用露光テーブル１として構成した。 - 特許庁

To provide: an exposure apparatus and an exposure method capable of preventing liquid from remaining on a substrate table, and keeping excellent exposure accuracy; and a method of manufacturing a device.例文帳に追加

基板テーブル上に液体が残留することを防止し、良好な露光精度を維持できる露光装置及び露光方法、デバイス製造方法を提供する。 - 特許庁