nitrogen group element complexとは 意味・読み方・使い方

The cleaning agent for hardly-decomposable aromatic halogen compound-contaminated soil comprises a metal complex compound of an iron group element (for example, iron) and a nitrogen-containing organic ligand (for example, porphyrin).例文帳に追加

鉄族元素（例えば鉄）と窒素含有有機配位子（例えばポルフィリン）との金属錯体化合物からなる難分解性芳香族ハロゲン化合物汚染土壌浄化剤。 - 特許庁

The organic electroluminescent element material is a transition metal complex comprising a compound as a ligand in which in an azole ring-condensed phenanthridine derivative such as imidazophenanthridine, pyrazolophenanthridine etc., carbon at 1-position or 10-position of phenanthridine skeleton is substituted with nitrogen and a substituted group such as an alkyl group or an aryl group comprising a hydrocarbon is introduced to the 1-position or 10-position facing the nitrogen.例文帳に追加

イミダゾフェナンスリジン、ピラゾロフェナンスリジン等のアゾール環が縮合したフェナンスリジン誘導体において、フェナンスリジン骨格の１位、あるいは１０位の炭素を窒素に置きかえ、さらにそれに対向する１位あるいは１０位にアルキル基やアリール基のような炭化水素からなる置換基を導入した化合物を配位子とする遷移金属錯体である有機エレクトロルミネッセンス素子材料。 - 特許庁

An iridium complex of a condensed heterocyclic compound such as oxazolo[5,4-b]pyridine, oxazolo[4,5-b]pyrazine and imidazolo[5,4-b]pyrazine substituted with a nitrogen-containing five-membered heterocyclic group such as 2-imidazolyl group and 1-pyrazolyl group gives an organic EL element material having controlled emission wavelength, high emission efficiency and long emission life.例文帳に追加

２−イミダゾリル、１−ピラゾリルなどの含窒素五員複素環が置換したオキサゾロ［５，４−ｂ］ピリジン、オキサゾロ［４，５−ｂ］ピラジン、イミダゾロ［５，４−ｂ］ピラジンなどの縮合複素環化合物のイリジウム錯体は発光波長が制御され、高い発光効率を示し、且つ発光寿命の長い有機ＥＬ素子材料となる。 - 特許庁

The method of manufacturing a nitride compound semiconductor element includes a growth step for epitaxially growing a nitride compound semiconductor layer consisting at least of group III atoms including gallium atoms and nitrogen atoms on a substrate, and a decomposition step for decomposing a complex of group III holes and hydrogen atoms in the nitride compound semiconductor layer by irradiating the nitride compound semiconductor layer with laser light or the ionization radiation before an element structure is formed.例文帳に追加

基板上に少なくともガリウム原子を含むＩＩＩ族原子と窒素原子とからなる窒化物系化合物半導体層をエピタキシャル成長する成長工程と、素子構造形成前に、前記窒化物系化合物半導体層にレーザ光または電離放射線を照射し、前記窒化物系化合物半導体層中のＩＩＩ族空孔と水素原子との複合体を分解する分解工程と、を含む。 - 特許庁