plasma exposureとは 意味・読み方・使い方

To provide an apparatus for manufacturing a semiconductor device, using plasma which reduces plasma damages stemming from plasma exposure.例文帳に追加

プラズマを用いて行う半導体装置の製造装置に於いて、プラズマ暴露により生じるプラズマ損傷を低減するための装置を提供する。 - 特許庁

To provide a plasma resistant member having reinforced mechanical strength and sufficiently durable against low pressure high density plasma exposure.例文帳に追加

機械的な強度が補強され、かつ低圧高密度プラズマ曝露に対しても十分耐える耐プラズマ性部材の提供。 - 特許庁

Next, a second plasma exposure process is carried out which makes the second processing plasmatic and makes it contact with the matter to be bonded which has been processed by the first plasma exposure process.例文帳に追加

次いで、第２処理ガスをプラズマ化して前記第１プラズマ照射工程を経た接合対象物に接触させる第２プラズマ照射工程を実行する。 - 特許庁

The element isolation region 16 is formed through exposure to CF_4 gas plasma and insulating processing.例文帳に追加

素子分離領域１６は、ＣＦ_4 ガスプラズマに晒して絶縁化させることで形成した。 - 特許庁

The process of increasing the mechanical strength includes a UV-ray exposure process and a hydrogen plasma process.例文帳に追加

機械的強度を増加させる処理は、紫外線照射、水素プラズマ処理を含む。 - 特許庁

To provide a plasma resistant member which is satisfactorily durable against the exposure with the plasma of low pressure and high density and is excellent in the transmission of high-frequency, and a producing method of the plasma resistant member.例文帳に追加

低圧高密度のプラズマ曝露などに対しても十分耐え、かつ高周波の透過性がすぐれている耐プラズマ性部材およびその製造方法の提供。 - 特許庁

ELECTROMAGNETIC WAVE TRANSMISSION DEVICE, ELECTROMAGNETIC WAVE RESONANCE DEVICE, PLASMA PROCESSING DEVICE, EXPOSURE SYSTEM, AND DEVICE MANUFACTURING METHOD例文帳に追加

電磁波伝送装置、電磁波共振装置、プラズマ処理装置、露光装置及びデバイス製造方法 - 特許庁

The exposure apparatus includes a plasma processing device which icnludes a first supply port capable of supplying a plasma produced from a process gas, and brings the plasma supplied from the first supply port into contact with a predetermined member coming into contact with the exposure liquid to enhance liquid repellency of a surface of the predetermined member to the exposure liquid.例文帳に追加

露光装置は、プロセスガスより生成されたプラズマを供給可能な第１供給口を有し、第１供給口から供給されたプラズマと露光液体と接触する所定部材とを接触させて、所定部材の表面の露光液体に対する撥液性を高めるプラズマ処理装置を備えている。 - 特許庁