プラズマ曝露の英語

低圧高密度プラズマ曝露に対しても十分耐える耐プラズマ性部材およびその製造方法の提供。例文帳に追加

To provide a plasma resistant member which sufficiently withstands exposure of a low-pressure, high-density plasma, and a method for manufacturing the same. - 特許庁

低圧高密度プラズマ曝露に対しても十分耐える耐プラズマ性部材およびその製造方法の提供。例文帳に追加

To provide a plasma resistant member which sufficiently withstands exposure of a low-pressure high-density plasma, and a method for manufacturing the same. - 特許庁

低圧高密度プラズマ曝露に対して、十分耐える耐プラズマ性部材及びその製造方法の提供。例文帳に追加

To provide a plasma resistant member which sufficiently withstands low-pressure, high-density plasma exposure, and to provide a production method therefor. - 特許庁

低圧高密度プラズマ曝露に対しても十分耐える耐プラズマ性部材およびその製造方法の提供。例文帳に追加

To provide a plasma resistant member exhibiting sufficient durability to plasma when it is exposed to low pressure and high density plasma, and to provide a method of producing the same. - 特許庁

プラズマ曝露後の輝度が高い真空紫外線励起発光素子用蛍光体を提供する。例文帳に追加

To provide a phosphor for a vacuum-ultraviolet-excited light emitting element, having high luminance after exposed to plasma. - 特許庁

プラズマチャージ評価基板を、半導体装置の製造工程で使用されるプラズマに曝露する工程と、プラズマチャージ評価基板を調べることにより、プラズマが基板に与えるプラズマチャージ量を評価する工程とを具備する。例文帳に追加

A plasma charge evaluation method comprises a process for exposing a plasma charge evaluation substrate to plasma used in the manufacturing process of a semiconductor device; and a process for evaluating the amount of plasma charge given to the substrate by plasma, by examining the plasma charge evaluation substrate. - 特許庁

この後、酸素を含むガス６に曝露した被処理物４の表面に再びプラズマ３を供給する。例文帳に追加

Thereafter, the plasma 3 is again supplied to the surface of the workpiece 4 subjected to the exposure of the gas 6 containing oxygen. - 特許庁

プラズマ曝露後の輝度が高く、かつ緑色の色純度の良い真空紫外線励起発光素子用蛍光体を提供する。例文帳に追加

To provide a phosphor for a vacuum-ultraviolet-excited light emitting element, having high luminance after exposed to plasma and having good color purity regarding green. - 特許庁