extreme sensitivityとは 意味・読み方・使い方

To provide a resist composition for electron beams, extreme UV rays or X-rays which has excellent sensitivity and resolving properties, and satisfies rectangular pattern shapes, dissolution contrast, and edge roughness.例文帳に追加

感度と解像性に優れ、更には矩形なパターン形状、溶解コントラスト、エッジラフネスをも満足する電子線、ＥＵＶ又はＸ線用レジスト組成物を提供する。 - 特許庁

To provide a photoresist capable of exhibiting so enhanced sensitivity and resolution that it is useful for imaging with a high energy radiation source such as EUV (extreme-ultraviolet radiation), electron beams, ion beams or X-rays.例文帳に追加

ＥＵＶ、電子ビーム、イオンビーム及びＸ線放射等の高エネルギー放射線源でのイメージングに有用な向上した感受性及び解像度を発揮することができるフォトレジストの提供。 - 特許庁

To provide a negative resist composition which has a high sensitivity and high resolution and decreased development defects in pattern formation by irradiation with active radiations (electron beams, X-rays, or EUV: extreme ultraviolet rays) for manufacturing of semiconductors, photomasks, etc.例文帳に追加

半導体、フォトマスク製造等のための、活性放射線（電子線、Ｘ線、又はＥＵＶ）の照射によるパターン形成において、高感度、高解像力で、現像欠陥が低減されたネガ型レジスト組成物を提供する。 - 特許庁

To provide a radiation sensitive resin composition capable of forming a chemically amplified resist film which effectively responds to electron beams or extreme ultraviolet rays and has excellent nano edge roughness, sensitivity, and resolution to stably produce a fine pattern with a high degree of accuracy.例文帳に追加

電子線や極紫外線に有効に感応し、ナノエッジラフネス、感度及び解像度に優れ、微細パターンを高精度に且つ安定して形成可能な化学増幅型レジスト膜を成膜することができる感放射線性組成物を提供する。 - 特許庁

To provide a radiation-sensitive resin composition achieving formation of a negative resist film that effectively responds to (extreme) far UV light of a KrF excimer laser, ArF excimer laser or the like, has excellent nano-edge roughness, sensitivity and resolution, and enables a fine pattern with high accuracy stably to be formed.例文帳に追加

ＫｒＦエキシマレーザー、ＡｒＦエキシマレーザー等の（極）遠紫外線等に有効に感応し、ナノエッジラフネス、感度及び解像度に優れ、微細パターンを高精度に且つ安定して形成可能なネガ型レジスト膜を成膜することができる感放射線性樹脂組成物。 - 特許庁

To provide a radiation-sensitive composition which is sensitive to radiation, particularly (extreme) far-ultraviolet radiation such as EUV with excellent sensitivity, and forms a chemically amplified positive resist film which enables to stably form a high-accuracy fine pattern excellent in nano edge roughness.例文帳に追加

放射線、特にＥＵＶ等の（極）遠紫外線に優れた感度で感応するとともに、ナノエッジラフネスに優れ、高精度な微細パターンを安定して形成可能な化学増幅型ポジ型レジスト膜を成膜することのできる感放射線性組成物を提供すること。 - 特許庁

To provide a radiation-sensitive resin composition capable of forming a chemically amplified negative resist film, which composition is effectively sensitive to EB (electron beam) or EUV (extreme ultraviolet radiation) and excellent in roughness, etching resistance, and sensitivity and which composition stably forms a highly precise fine pattern.例文帳に追加

ＥＢ（電子線）又はＥＵＶ（極紫外線）に有効に感応し、ラフネス、エッチング耐性、及び感度に優れ、高精度な微細パターンを安定して形成することのできる化学増幅型のネガ型レジスト膜を成膜可能な感放射線性樹脂組成物を提供すること。 - 特許庁

To provide a radiation sensitive resin composition capable of forming a chemically amplified resist film which effectively responds to electron beams or extreme ultraviolet rays and has excellent nano edge roughness, sensitivity, and resolution to stably produce a fine pattern with a high degree of accuracy, and to provide a polymer used therefor.例文帳に追加

電子線や極紫外線に有効に感応し、ナノエッジラフネス、感度及び解像度に優れ、微細パターンを高精度に且つ安定して形成可能な化学増幅型レジスト膜を成膜することができる感放射線性組成物及びそれに用いられる重合体を提供する。 - 特許庁