main deflection systemとは 意味・読み方・使い方

A pre-deflection optical system is provided on the side of the light source of the optical scanning means, and the pre-deflection optical system includes a lens having different powers in the main scanning direction and the subscanning direction.例文帳に追加

光走査手段の光源側には偏向前光学系を備え、当該偏向前光学系は主走査方向と副走査方向とでパワーの異なるレンズを含む。 - 特許庁

Also, while movable members is kept stationary, the main beam (first main beam) PR of the light beam deflected by a deflection mirror face 651 and the optical axis OA of the scanning lens system 66 are parallel with and separated from each other in the main scanning cross section.例文帳に追加

また、可動部材を静止させた状態で偏向ミラー面６５１により偏向される光ビームの主光線（第１主光線）ＰＲと走査レンズ系６６の光軸ＯＡとが主走査断面において互いに平行で且つ離間している。 - 特許庁

To provide a multi-beam light scanning optical system capable of reducing an interval of a main ray of each light beam on a deflection face so as to effectively suppress production of jitter due to out of focus in the main scanning direction and to provide an image forming device using the optical system.例文帳に追加

偏向面上の各光ビームの主光線の間隔を減少させ、主走査方向のピントずれによるジッターの発生を効果的に抑制することができるマルチビーム光走査光学系及びそれを用いた画像形成装置を得ること。 - 特許庁

A deflection plate 103 is provided detachably, so that the deflecting lens 104a of an optical system is arranged in a specified array on the front surface of an image display surface 102 of a display device main body 101.例文帳に追加

表示装置本体１０１の画像表示面１０２の前面に光学系の偏向レンズ１０４ａが特定の配列に並ぶように偏向板１０３を脱着自在に設ける。 - 特許庁

Concerning a main switching element of a primary-side voltage-resonance type converter, switching s performed in synchronization with the frequency of a horizontal synchronous signal obtained from a horizontal deflection circuit system.例文帳に追加

そして、一次側電圧共振形コンバータのメインスイッチング素子については、水平偏向回路系から得られる水平同期信号周波数に同期してスイッチングを行うようにされる。 - 特許庁

Further, the light beam which is made incident onto the deflection mirror face 651 with a first optical system 63 is shaped into a slender cross section shape extending in the main scanning direction X, and the movable plate 653 is shaped into a slender form extending along the main scanning direction X.例文帳に追加

また、第１光学系６３によって偏向ミラー面６５１に入射する光ビームを主走査方向Ｘに伸びる細長断面形状に整形する一方、可動板６５３を主走査方向Ｘに伸びる細長形状に仕上げている。 - 特許庁

To improve the throughput of an electron beam exposure system and its operating method by shortening the time required for deflection and exposure without degrading the exposing accuracy when the deflection by a main deflector is transferred to a region in which exposure is possible by a sub-deflector at a high speed by using a feedback deflector.例文帳に追加

電子ビーム露光及びその操作方法に関し、フィードバック偏向器を用いて主偏向器による偏向を副偏向器の露光可能範囲に高速に持っていく場合に、露光精度を劣化させることなく偏向及び露光に必要とする時間を短くしてスループットを向上させる。 - 特許庁