張磨の英語

被研磨物を研磨パッドに押圧して研磨する際に、メンブレンの膨張を最小限に抑え、研磨の面内均一性を向上させること。例文帳に追加

To suppress expansion of a membrane to the minimum extent and improve uniformity in a plane of polishing when pressing an object to be polished against a polishing pad and polishing it. - 特許庁

シリコンウェーハＷ表面に研磨液を供給しながら、上面に研磨布１３が展張された研磨定盤１１上で、シリコンウェーハＷの研磨面を研磨布１３により表面研磨する。例文帳に追加

The polishing surface of a silicon wafer W is polished by polishing cloth 13 over a polishing level block 11 on which the polishing cloth 13 is stretched while abrasion liquid is being fed to the surface of the silicon wafer W. - 特許庁

ベルト式揚送研磨機の研磨布を引き出して容易に緊張状態に保持する研磨布の保持装置を安価に提供する。例文帳に追加

To inexpensively provide an abrading cloth holding device for drawing out an abrading cloth of a belt-type elevating and carrying abrading machine and easily holding it under a stretched condition. - 特許庁

研磨布部１５に、揚送ベルト１２との対向部の研磨布を引張移動する一対のローラを備えた引張駆動部４０が配設される。例文帳に追加

On the polishing cloth section 15, a pull-driving section 40 equipped with a pair of rollers which pull and move the polishing cloth on the confronted section with the pumping belt 12 is arranged. - 特許庁

研磨布部１５に、揚送ベルト１２との対向部の研磨布を引張移動する一対のローラを備えた引張駆動部４０が配設される。例文帳に追加

The polishing cloth part 15 is disposed with a tension driving part 40 having a pair of rollers pullingly moving the polishing cloth placed in the opposed part to the lift belt 12. - 特許庁

屋号は初代と二代目が播磨屋(歌舞伎)、以後が尾張屋。例文帳に追加

The first and the second generations had the yago (stage family name) of Harima-ya, and the subsequent generations have used Owari-ya as their yago.発音を聞く  - Wikipedia日英京都関連文書対訳コーパス

出雲・美作・播磨・摂津・伊勢・尾張・三河・能登・常陸が各1基。例文帳に追加

One mounds: Izumo, Mimasaka, Harima, Settsu, Ise, Owari, Mikawa, Noto, and Hitachi.発音を聞く  - Wikipedia日英京都関連文書対訳コーパス

半導体基板の研磨方法および張り合わせ半導体基板の製造方法例文帳に追加

METHOD FOR POLISHING SEMICONDUCTOR SUBSTRATE AND MANUFACTURE OF LAMINATED SEMICONDUCTOR SUBSTRATE - 特許庁