膜差圧の英語

差圧弁用膜弁、その製造方法、及びインク供給容器例文帳に追加

MEMBRANE VALVE FOR DIFFERENTIAL PRESSURE REGULATING VALVE, METHOD OF MANUFACTURING THE SAME AND INK SUPPLY VESSEL - 特許庁

圧電薄膜１４は、膜面に対して交差する方向に延びる柱状の結晶を含んでいる。例文帳に追加

The piezoelectric thin film 14 contains a columnar crystal extended in a direction in crossing with the film face. - 特許庁

また、分離膜の活性層の厚みを変えることにより膜間差圧を制御することができる。例文帳に追加

Besides, by changing the thickness of the active layer of the separating membrane, the inter-membrane differential pressure can be controlled. - 特許庁

膜ろ過の進行により膜２の膜差圧が上昇した際、原水よりも５〜５０℃程度加温された逆洗水により膜２を逆洗する。例文帳に追加

When the membrane difference pressure of a membrane rises by the advance of membrane filtration, the membrane 2 is backwashed with backwashing water heated to temperature higher than that of raw water by about 5-50°C. - 特許庁

パルス逆洗は分離膜の膜差圧が許容膜差圧の８０％以下の段階で実施されるもので、膜面の堆積物を剥離し、剥離された堆積物は循環流に乗せて生物処理槽に返送される。例文帳に追加

The pulse back cleaning is carried out under the condition that the pressure difference of the separation membrane is not greater than 80% of an allowable pressure difference of the membrane, wherein a deposited matter on the surface of the membrane is peeled off and returned to the biological treatment tank on a circulation flow. - 特許庁

洗浄液を限外ろ過膜分離装置５に供給し、限外ろ過膜に透過させて洗浄を行うにあたって、膜間差圧を、通常運転時の膜間差圧以上となるように設定する。例文帳に追加

When a cleaning liquid is supplied to an ultrafiltration membrane separation apparatus 5 and permeated through an ultrafiltration membrane to clean the ultrafiltration membrane, the differential pressure between the water to be supplied to the apparatus 5 and the permeated water is set to be equal to or larger than that during the normal operations of the apparatus 5. - 特許庁

前記膜分離装置３の膜差圧を圧力センサ３２で監視し、膜差圧が所定値以上に急上昇する非定常時には、前記曝気装置４から供給される曝気風量を増加させる。例文帳に追加

A membrane differential pressure of the membrane separator 3 is monitored by a pressure sensor 32 and, at the non-stationary time when the membrane differential pressure rises suddenly over the predetermined value, the aeration quantity supplied from the aerator 4 is increased. - 特許庁

圧電体薄膜層１６を形成する工程において、成膜時における圧電体薄膜層１６に圧縮応力を付与することにより、成膜後の冷却時に基板１１と圧電体薄膜層１６との収縮量の差によって圧電体薄膜層１６に生じる引張応力を緩和する。例文帳に追加

In a process of forming the piezoelectric thin film layer 16, a compressive stress is applied to the piezoelectric thin film layer 16 when it is formed in order to reduce the tensile stress occurring in the piezoelectric thin film layer 16 due to a difference in shrinkage between the substrate 11 and the piezoelectric thin film layer 16 when the piezoelectric thin film 16 is cooled after formation. - 特許庁