insulation resistance constantとは 意味・読み方・使い方

DC CONSTANT-CURRENT CIRCUIT AND INSULATION RESISTANCE MEASURING APPARATUS FOR CAPACITOR例文帳に追加

直流定電流回路及びコンデンサの絶縁抵抗測定装置 - 特許庁

To provide an insulation film having a high dielectric constant, a high heat resistance, a high moisture resistance and a high oxygen plasma resistance, and also to provide a method for manufacturing the film.例文帳に追加

誘電率が低く，高い耐熱性，高い耐吸湿性及び高い酸素プラズマ耐性を有する絶縁膜及びその製造方法を与える。 - 特許庁

To obtain a polymer insulation material excellent in electric characteristics such as a dielectric constant, a dissipation factor, insulation properties, and the like, solvent resistance, heat resistance and thermal shock resistance, to provide a method for manufacturing the polymer insulation material, an electronics-related substrate and an electronic member.例文帳に追加

誘電率、誘電正接、絶縁性等の電気特性、耐溶剤性、耐熱性及び耐熱衝撃性に優れた高分子絶縁材料及び高分子絶縁材料の製造方法並びに電子関連基板及び電子部材を提供する。 - 特許庁

To obtain a resin for insulation films that can give an insulation film having high heat resistance, low water absorption and low dielectric constant, to obtain a coating varnish containing the resin for insulation film, and to prepare the insulation film having the high heat resistance, low water absorption and low dielectric constant.例文帳に追加

高耐熱性、低吸水性および低誘電率を有する絶縁膜を得ることができる絶縁膜用樹脂、該絶縁膜用樹脂を含むコーティングワニス、また、高耐熱性、低吸水性、低誘電率である絶縁膜を提供する。 - 特許庁

To readily produce an insulation film which is low in dielectric constant, and superior in heat resistance and moisture resistance, to realize a semiconductor device which enables high speed operations and is high in reliability, in a method for forming a low dielectric constant insulation film, the low dielectric constant insulation film formed by the method, and the semiconductor device using the low dielectric constant insulation film.例文帳に追加

低誘電率絶縁膜の形成方法及び該方法で形成された低誘電率絶縁膜及び該低誘電率絶縁膜を用いた半導体装置に関し、誘電率が低く、且つ、耐熱性及び耐湿性に優れた絶縁膜を容易に作成できるようにし、高速動作が可能であると共に信頼性が高い半導体装置を実現しようとする。 - 特許庁

To provide a polymer giving an insulation film having low relative dielectric constant and excellent CMP resistance and chemical liquid resistance, a method for producing the polymer, a composition for forming an insulation film, a method for producing an insulation film, and a silica-based insulation film.例文帳に追加

比誘電率が低く、かつ、ＣＭＰ耐性および薬液耐性に優れた絶縁膜を形成することができるポリマーおよびその製造方法、絶縁膜形成用組成物、絶縁膜の製造方法、ならびにシリカ系絶縁膜を提供する。 - 特許庁

To provide a composition for forming an electrical insulation film capable of forming electrical insulation film with low hygroscopicity and dielectric constant, high etching resistance and chemical liquid resistance and high mechanical strength; to provide a polymer related thereto and a method for producing the polymer; to provide a method for producing such electrical insulation film; and to provide silica-based electrical insulation film.例文帳に追加

吸湿性および比誘電率が低く、エッチング耐性および薬液耐性に優れ、かつ、機械的強度に優れた絶縁膜を形成することができる絶縁膜形成用組成物、ポリマーおよびその製造方法、絶縁膜の製造方法、ならびにシリカ系絶縁膜を提供する。 - 特許庁