multi-layered filmsとは 意味・読み方・使い方

The varnish is used to form the electric insulating films to obtain the multi-layered circuit substrate.例文帳に追加

このワニスを用いて電気絶縁膜を形成し、多層回路基板を得る。 - 特許庁

The multi-layered optical filter 1 has optical films 3a_1 to 3aN laminated.例文帳に追加

複数の光学膜３ａ１〜３ａＮが積層されて成る多層膜光学フィルタ１。 - 特許庁

A multi-layered film element 4 is composed of a multi-layered film 1 formed by laminating a plurality of films so that adjacent layers (films) have mutually different refractive indexes and has no substrate, and compensating films 2 are further laminated on the top and reverse surfaces of the multi-layered film 1 to reduce spectral characteristic variation of the multi-layered film 1 with temperature.例文帳に追加

本発明の多層膜素子４は、隣接する層間（膜間）で屈折率が互いに異なるように複数の膜を積層した多層膜１から構成された基板を持たない多層膜素子であって、前記多層膜１の温度に対する分光特性変化を低減する為に、補償膜２が多層膜１の上面上と下面上に更に積層されている。 - 特許庁

Dielectric material multi-layered films 310 and 311 each of which consists of n-layered films of Si films 320 having a refractive index Ms=3.11 and SiO2 films 321 having a refractive index Mt=1.415 are provided on both sides of a magnetic material thin film 307 to form the magnetooptical body 300.例文帳に追加

磁気光学体３００は、磁性体薄膜３０７の両側に屈折率Ms＝３．１１のSi膜３２０と屈折率Mt＝１．４１５のSiO_2膜３２１とのｎ層の積層膜からなる誘電体多層膜３１０，３１１を設けて構成した。 - 特許庁

Thereafter, the substrate having these multi-layered films is mounted in a plasma etching chamber and a stage temperature is set to about 310°C.例文帳に追加

その後、これらの多層膜を有する基板２がプラズマエッチングチャンバ内に載置され、ステージ温度を３１０℃程度に設定する。 - 特許庁

Each dielectric material multi-layered film 310 and 311 is formed by laminating n layers of films consisting of Si films 320 and SiO2 films 321 and third dielectric material thin films 330 and 331 consisting of the Si film and having prescribed thickness are interposed between each dielectric material multi-layered film 310 and 311 and a magnetic body thin film 307, respectively, to form the magnetooptical body 300.例文帳に追加

磁気光学体３００は、Si膜３２０及びSiO_2膜３２１をｎ層積層して誘電体多層膜３１０，３１１を形成し、誘電体多層膜３１０，３１１のそれぞれと磁性体薄膜３０７との間に、Si膜の所定厚さの第３の誘電体薄膜３３０，３３１を介装した。 - 特許庁

With respect to multi-layered films consisting of the first silicon oxide film 2, the first polysilicon 3, the first silicon nitride film 4, the second silicon oxide film 5 and the second silicon nitride film 6, only the film 6 is tapered and the other multi-layered films are not tapered to control the opening size to be narrow.例文帳に追加

第１のシリコン酸化膜２、第１のポリシリコン３、第１のシリコン窒化膜４、第２のシリコン酸化膜５、第２のシリコン窒化膜６という多層膜に対し、本発明に従って、第２のシリコン窒化膜６のみにテーパをつけ、かつ他の多層膜にはテーパをつけず開口寸法を細く制御している。 - 特許庁