央磨の英語

中央部に貫通孔が形成された磁気記録媒体用ガラス基板の端面を研磨する場合に、外周端面の研磨工程を第１研磨工程と第２研磨工程に分け、第１研磨工程と第２研磨工程の研磨条件を変える。例文帳に追加

When an end face of a glass substrate for a magnetic recording medium having a through hole formed at the center is subjected to polishing, the polishing step of the circumferential end face comprises a first polishing step and a second polishing step, in which the polishing conditions are varied between the first polishing step and the second polishing step. - 特許庁

研磨時の基板中央付近へのスラリー保持量を増加させることにより、基板中央部の研磨不足を解消し、基板研磨量の面内均一性を向上させた研磨クロス、それを備えたＣＭＰ装置及びＣＭＰ研磨方法を提供する。例文帳に追加

To provide a polishing cloth, a CMP apparatus provided with the same and a CMP method in which in-plane uniformity of a wafer polishing quantity is improved by eliminating lack of polishing in a middle portion of the wafer by increasing a quantity of slurries to be held near the middle of the wafer during polishing. - 特許庁

つまり、被研磨物の中央部とそれ以外では、研磨レートが大きく異なるが、被研磨物の中央部に接触する第２領域２４の硬さを高め、被研磨物の中央部に接触しない第１領域２３および第３領域２５の硬さを低くすることによって、被研磨物全面において研磨レートを均一にすることができる。例文帳に追加

Though the polishing rate at the central part of the workpiece is largely different from the other part, the polishing rate can be made to be uniform in the whole surface of the workpiece by increasing the hardness of a second area 24 contacting the workpiece and decreasing the hardness of a first area 23 and a third area 25 not contacting the central part of the workpiece. - 特許庁

中央研磨ホイールは、横支持ホイールの径よりも大きな径を有し、周方向で離間する一連の歯を含む研磨周部を与える。例文帳に追加

The central polishing wheel has a diameter larger than those of the side supporting wheels, and provides a polishing peripheral portion, which includes a series of teeth separated in the peripheral direction. - 特許庁

これにより研磨部材保持部材５を表裏裏返して中央部材４に係合させ、両面の研磨部材のそれぞれを使用できる。例文帳に追加

Therefore, the grinding member holding member 5 is engaged with the center member 4 with tuning in side out, thereby enabling use of grinding members on both faces. - 特許庁

その研磨に際しては、中央孔に、その上部から研磨液Ｌが供給されるのみならず、側部開口部３２からスペーサ部材の研磨液供給通路を介しても研磨液が供給される。例文帳に追加

During grinding, the grinding fluid L is supplied to the central hole from the upper portion, and also the grinding fluid is supplied from a side opening portion 32 through the polishing fluid supply passage of the spacer member. - 特許庁

このようにすれば、フェルール先端面１０Ａは、研磨面積が狭い中央部が多く研磨される一方、研磨面積が広い両端部が少なく研磨される結果、その平滑度が向上する。例文帳に追加

As a result, the tip face 10A of the ferrule is polished more in the center area where polishing area is narrower, while being polished less in both end areas where polishing area is wider, so that smoothness is improved. - 特許庁

研磨面２５には、研磨面２５に形成される非球面の頂点を含む中央部分に加わる研磨圧を抑制する研磨抑制領域２６が設けられている。例文帳に追加

On the polishing surface 25, a polishing suppressing region 26 is arranged which suppresses the polishing pressure applied to the center part including a vertex of the aspheric surface shaped in the polishing surface 25. - 特許庁