elemental semiconductorとは 意味・読み方・使い方

METHOD FOR MANUFACTURING ELEMENTAL SUBSTRATE COMPOSED OF NITRIDE SEMICONDUCTOR例文帳に追加

窒化物半導体から成る単体基板の製造方法 - 特許庁

ELEMENTAL ANALYSIS METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE例文帳に追加

元素分析方法および半導体装置の製造方法 - 特許庁

The semiconductor wafer and the support plate are separately collected which are now separated and become elemental substances.例文帳に追加

分離されて単体となった半導体ウエハと支持板は、それぞれ個別に回収される。 - 特許庁

To provide an elemental analysis method by which a metal impurity element present locally on the surface of or inside a semiconductor substrate and the like can be detected and quantified in a practically feasible period of time, and to provide a manufacturing method of a semiconductor device which is implemented on an inline basis.例文帳に追加

半導体基板等の表面または内部において局所的に存在する金属不純物元素を現実的な時間内で検出、定量可能な元素分析方法を提供する。 - 特許庁

To provide a method of manufacturing a semiconductor device, which has superior elemental characteristic almost equivalent to that of the wafer formed through wafer thinning technology even if a thick wafer is used, and which is excellent in productivity.例文帳に追加

厚いウエハを用いても素子特性が薄ウエハ化技術により作成されたウエハと同程度に良好で、かつ生産性に優れた半導体装置の製造方法の提供。 - 特許庁

To provide a unibody, multi-piece crucible for use in elemental purification, compounding, and growth of semiconductor crystals, e.g., in the process of molecular beam epitaxy (MBE) for melting silicon or the like at high temperature.例文帳に追加

半導体結晶の元素の精製、複合化および成長、例えば、高温でシリコン等を溶解する分子線エピタキ法（ＭＢＥ）において用いる一体もの、複数片のるつぼを提供する。 - 特許庁

The elemental analysis method can be applied to semiconductor device manufacturing processes to analyze metal contamination or quantify a conductivity determining impurity element on the inline basis and with a high degree of accuracy.例文帳に追加

また、当該元素分析方法を、半導体装置の製造工程に適用することで、金属汚染の分析や導電型決定不純物量の定量をインラインでかつ高精度に実施できる。 - 特許庁