physical cleaningとは 意味・読み方・使い方

Thereby, physical force applied to the substrate W by the cleaning head 60 is always kept constant, and high particle removal capability can be balanced with suppression of physical damage.例文帳に追加

これにより、洗浄ヘッド６０が基板Ｗに与える物理力は常に一定となり、高いパーティクル除去能力と物理的ダメージの抑制とを両立することができる。 - 特許庁

The physical cleaning mechanism 70 removes defects from the plating membrane on the substrate 2 by applying the physical force to the substrate 2 before the substrate 2 is dried.例文帳に追加

物理洗浄機構７０は、基板２が乾燥されるよりも前に基板２に対して物理力を印加することにより、基板２上のめっき膜からデフェクトを除去する。 - 特許庁

A substrate cleaning apparatus 1 includes a circular substrate holding part 2 for holding the outer edge of the substrate 9, a first cleaning mechanism 3 for dry physical cleaning the lower surface of the substrate 9, and a second cleaning mechanism 4 for wet cleaning the upper surface of the substrate 9 using liquid.例文帳に追加

基板洗浄装置１は、基板９の外縁部を保持する円環状の基板保持部２、基板９の下面にドライ物理洗浄を行う第１洗浄機構３、および、基板９の上面に液体を用いるウェット洗浄を行う第２洗浄機構４を備える。 - 特許庁

To obtain a novel cleaning liquid composition having cleaning functions sufficiently, and even if an equipment for a polyurethane resin or epoxy resin is reopend under the condition that the equipment is wet with the cleaning liquid, the cleaning fluid does not impart any adverse effect at all to the physical properties of the above obtained resins.例文帳に追加

洗浄機能は充分有しているが、装置に洗浄液が付着した状態でウレタン樹脂やエポキシ樹脂の装置を再開しても、得られた樹脂の物性に全く悪影響を与えない新規な洗浄剤の提供。 - 特許庁

To obtain a composition for the mouth, having high mechanical strength, excellent in physical cleaning power and capable of easily performing oral cavity cleaning without needing the selection of the place for use.例文帳に追加

機械的強度が高く物理的清掃力に優れ、使用場所を選ぶことなく手軽に口腔清掃を行うことのできる口腔用組成物を提供する。 - 特許庁

In the substrate cleaning apparatus 1, dry physical cleaning is performed by the first cleaning mechanism 3 to the lower surface of the substrate 9 held at the substrate holding part 2, the wet cleaning is performed according to the second cleaning mechanism 4 to the upper surface, and the one main surface can clean simultaneously the main surface of both sides of the substrate which is not fit for the wet cleaning.例文帳に追加

基板洗浄装置１では、基板保持部２に保持された基板９の下面に対して第１洗浄機構３によりドライ物理洗浄が行われ、上面に対して第２洗浄機構４によりウェット洗浄が行われることにより、一方の主面がウェット洗浄に向かない基板の両側の主面を同時に洗浄することができる。 - 特許庁

The cleaning subsystem 72 further includes a second cleaning member that is in physical contact with the first cleaning member and has a relatively hard and smooth surface so as to allow the residual ink removed from the imaging member and adhering to the adhesive surface of the first cleaning member to be separated to the second cleaning member.例文帳に追加

清掃サブシステム７２はさらに、第１の清掃部材に物理的に接触する第２の清掃部材で、作像部材から除去されて第１の清掃部材の付着面に付着する残留インクをその上へ分離させるよう比較的硬質で平滑な面を有する第２の清掃部材を含む。 - 特許庁

To provide a supercritical cleaning method requiring no substitution accelerator nor physical stirring, ultrasonic vibration or the like.例文帳に追加

置換促進剤を必要とせず、しかも物理的な攪拌、超音波振動等を必要としない超臨界洗浄方法を提供する。 - 特許庁