solution providedとは 意味・読み方・使い方

An absorbing solution tank 7 for storing the absorbing solution 2 is provided below the stationary mixer 3, and the absorbing solution tank 7 and the absorbing solution sprinkler pipe 4 are connected by an absorbing solution circulation line 9 and the absorbing solution 2 in the absorbing solution tank 7 is supplied to the absorbing solution sprinkler pipe 4.例文帳に追加

静止型混合器３の下方には、吸収液２を貯留する吸収液タンク７が設けられ、吸収液タンク７と吸収液散水管４とが吸収液循環ライン９により連結されて、吸収液タンク７の吸収液２が吸収液散水管４に供給される。 - 特許庁

PLATING SOLUTION CONTROL DEVICE, PLATING APPARATUS PROVIDED THEREWITH, AND METHOD FOR PREPARING COMPOSITION OF PLATING SOLUTION例文帳に追加

メッキ液管理装置、それを備えたメッキ装置、およびメッキ液組成調整方法 - 特許庁

The deodorant prepared by adding an aqueous solution ionization substance into an aqueous solution is provided.例文帳に追加

水溶液中に水溶液イオン化物質を添加したことを特徴とする消臭剤を提供すること。 - 特許庁

An electrolyte (B) containing a compound (A) expressed by general formula (1), an electrolyte solution containing the electrolyte (B), and an electrochemical device using the electrolyte solution are provided.例文帳に追加

一般式（１）で表される化合物（Ａ）を含有してなる電解質（Ｂ）。 - 特許庁

An introduction part for an aqueous urea solution 1 is connected to a pass 2 for the urea solution provided with a heater 7 for heating the urea solution inside the pass 2.例文帳に追加

尿素水導入部１に尿素水が流通する流通路２を接続し、この流通路２内の尿素水を加熱する加熱手段７を備える。 - 特許庁

The refrigerator also comprises a solution reservoir 22 formed at a lower part of the absorber to communicate with the solution pump and a solution tank 25 provided separately from the reservoir.例文帳に追加

吸収器の下部に溶液ポンプと連通する溶液溜め２２を形成し、溶液溜めとは別体に溶液タンク２５を設ける。 - 特許庁

The residue filtering-separation apparatus 42 is provided with: a first aqueous solution tube 88 through which the aqueous solution flows in; a filter press 80; and a second aqueous solution tube 90.例文帳に追加

残渣ろ過分離装置４２は、水溶液が流入する第１水溶液管８８と、フィルタプレス８０と、第２水溶液管９０とを備える。 - 特許庁

This manufacturing apparatus 1 of the artificial lipid double film is equipped with an upper solution tank (first solution tank) 11 filled with an aqueous solution 13 and a lower solution tank (second solution tank) 12 and a partition 15 for partitioning the upper and lower solution tanks 11 and 12 is provided between two solution tanks.例文帳に追加

本発明の人工脂質二重膜の製造装置１は、水溶液１３で満たされた上溶液槽（第１の溶液槽）１１と下溶液槽（第２の溶液槽）１２を備えており、上溶液槽１１と下溶液槽１２との間には、上記２つの溶液槽を仕切る隔壁１５が設けられている。 - 特許庁