work‐affected layerの英語

To provide a method for designing a resin-coated saw wire that provides a cut body with a shallow depth of a work-affected layer and with a smooth surface when a workpiece is cut off by using the resin-coated saw wire obtained by coating the surface of a steel wire with resin.例文帳に追加

鋼線の表面に樹脂を被覆した樹脂被覆ソーワイヤを用いてワークを切断したときに、加工変質層深さが浅く、平滑な表面の切断体が得られる樹脂被覆ソーワイヤの設計方法を提供する。 - 特許庁

The outer peripheral part of a nitride semiconductor wafer is chamfered with a rubber grinding stone or a resin foam bonded grinding stone comprising 0-40 wt.% of oxide abrasive grains to allow a work-affected layer having a thickness of 0.5-10 μm to remain on the outer peripheral part.例文帳に追加

窒化物半導体ウエハー外周部を０〜４０重量％の酸化物砥粒を含むゴム砥石或いは発泡レジンボンド砥石でチャンファーし、外周部に加工変質層を０．５μｍ〜１０μｍの厚さで残すようにする。 - 特許庁

To provide an effective method for polishing the surface of a silicon carbide single crystal wafer capable of finish polishing (polishing) by removing a work-affected layer from the surface of the chemically stable silicon carbide single crystal wafer roughly polished (lapped) to provide a high quality surface.例文帳に追加

本発明は、荒研磨(ラップ)した化学的に安定な炭化珪素単結晶ウェハ表面から加工変質層を除去して仕上げ研磨(ポリッシュ)することで、高品質な表面を得る効果的な方法を提供する。 - 特許庁

To provide a manufacturing method for acquiring a glass substrate for magnetic recording medium polishing an end face of a glass substrate at a high polishing speed while suppressing a use of cerium oxide abrasives and producing no work-affected layer like a flaw on the end face such as a chamfer part or the like.例文帳に追加

ガラス基板の端面を酸化セリウム砥粒の使用をできるだけ抑えながら、かつ高い研磨速度で研磨し、面取り部等の端面にキズ等の加工変質層がない磁気記録媒体用ガラス基板を得るための製造方法を提供する。 - 特許庁

To provide a method for measuring a characteristic of a piezo-electric element, which can simply and precisely determine a polarization reversing characteristic or a distribution state of dipoles in the piezo-electric element, in order to evaluate a polarization reversing behavior and/or evaluate a work-affected layer of the piezo-electric element.例文帳に追加

圧電体の加工変質層の評価及び／又は分極反転挙動の評価のために、圧電体内部の双極子の分布状態又は分極反転特性をより簡便に且つ精度良く判定し得る圧電体特性測定方法を提供すること。 - 特許庁

The device includes a magnetic sensor 10 having a sensor head 12 for magnetically detecting a work-affected layer on an inspection surface of a workpiece 2, and a contact member 20 brought into contact with the workpiece 2 and arranged on the sensor head 12 so that the distance between the sensor head 12 of the magnetic sensor 10 and the inspection surface of the workpiece 2 is maintained in a predetermined range.例文帳に追加

センサヘッド１２を有し磁気を用いて工作物２の検査表面の加工変質層を検出する磁気センサ１０と、工作物２に接触し磁気センサ１０のセンサヘッド１２と工作物２の検査表面との離隔距離を所定範囲に維持するようにセンサヘッド１２に配置される接触部材２０とを備える。 - 特許庁

The polishing method finish polishes (polishes) the surface of the silicon carbide single crystal roughly polished (lapped) by a diamond mechanical polishing with a colloidal silica slurry having a high oxidizing property or including a large amount of dissolved oxygen to remove the work-affected layer occurred during the diamond mechanical polishing, efficiently creating the high quality surface.例文帳に追加

ダイヤモンド機械研磨で荒研磨(ラップ)した炭化珪素単結晶ウェハ表面を、酸化性が高い或いは溶存酸素を豊富に含むコロイダルシリカスラリーで仕上げ研磨(ポリッシュ)することで、ダイヤモンド機械研磨で発生した加工変質層を除去して高品質な表面を効率的に創成する研磨方法である。 - 特許庁