Substrate Tiltとは 意味・読み方・使い方

A rotation driving mechanism part and a tilt mechanism part are controlled by a control unit 40, thereby continuously changing the tilt angle θ of a substrate holder 20 and a substrate 28' for the recording medium, from the minimum tilt angle to the maximum tilt angle, according to increase of film thickness of a protective film layer during film deposition.例文帳に追加

回転駆動機構部およびチルト機構部が制御ユニット４０に制御されることにより、基板ホルダー２０および記録媒体用基板２８’の傾斜角θが、成膜中、保護層の膜厚の増大に応じて最小傾斜角度から最大傾斜角度まで連続的に変化する。 - 特許庁

A tilt adjusting mechanism 22 can be set by adjusting the relative tilt of the dressing surface 13 to a required tilt on the basis of the lower surface of the substrate 5.例文帳に追加

傾き調整機構２２は、基材５の下面を基準としたドレッシング面１３の相対的な傾きを所望の傾きに調整して設定し得る。 - 特許庁

Moreover, distribution of tilt angles between concavo-convex surfaces and the substrate surface within the concavo-convex face is optimized.例文帳に追加

また、凹凸表面と基板表面が成す傾斜角の凹凸面内での分布を最適化した。 - 特許庁

To effectively remove a solvent in a dyestuff film without degrading the tilt of an optical disk substrate.例文帳に追加

光ディスク基板のチルトを悪化させること無く、有効に色素膜中の溶剤を除去すること。 - 特許庁

To dispense with real-time adjustments which are made in the tilt and level of an exposure substrate in an exposure process.例文帳に追加

露光中に行う露光用基板の傾きおよび高さの実時間調整をなくす。 - 特許庁

The device includes a tilt mechanism (rotation/tilt mechanism 14) for holding a substrate (wafer 10) and directing the extending direction of the substrate in the gravity direction, and a mechanism 20 for electrically neutralizing the deposits on the surface of the substrate.例文帳に追加

基板（ウエハ１０）を保持して基板の延在方向を重力方向に向ける傾斜機構（回転・傾斜機構１４）と、前記基板の表面に付着している付着物を電気的に中和する除電機構２０とを備える。 - 特許庁

A two-dimensional area 5 on a substrate 3 and a two-dimensional area 6 on a tilt plane 4 are scanned by the probe of a scanning probe microscope to calculate the angle formed by the two 2 dimensional areas 5 and 6 in this measuring method of the tilt angle 2 of the tilt plane 4 formed on the substrate 3.例文帳に追加

基板３上に形成された傾斜面４の傾斜角２の計測手法において、基板３上の２次元領域５と傾斜面４上の２次元領域６とを走査プローブ顕微鏡のプローブにより走査し、２つの２次元領域５と６のなす角を算出する。 - 特許庁

The tilt angle of a sidewall of the first opening 111 to a substrate principal surface is >58° and the tilt angle of a sidewall of the second opening 112 to the substrate principal surface is ≤58°.例文帳に追加

第１開口部１１１の側壁の基板主面に対する傾斜角は５８°よりも大きく、第２開口部１１２の側壁の基板主面に対する傾斜角は５８°以下である。 - 特許庁