space composition methodとは 意味・読み方・使い方

To provide a method for producing an unvulcanized rubber composition in which labor saving, space saving, energy saving and cost reduction are contrived.例文帳に追加

未加硫ゴム組成物の製造における省力化、省スペース化、省エネルギー化及びコストダウンを図る。 - 特許庁

The method, the computer readable medium and the system for vapor deposition on a substrate introduce a first process gas composition to a process space according to a first vapor deposition process, deposit a first film on the substrate, introduce a second process gas composition into a second process space different in size from the first process space, and deposit a second film on the substrate from the second process gas composition.例文帳に追加

第１の蒸着プロセスに係る処理空間に第１のプロセスガス組成を導入し、基板上に第１の膜を堆積させ、第１の処理空間よりサイズが異なる第２の処理空間に第２のプロセスガス組成を導入し、そして第２のプロセスガス組成から基板上に第２の膜を堆積させる基板上への蒸着のための方法、コンピュータ読み取り可能なメディア、およびシステムである。 - 特許庁

To provide a deodorant composition having excellent deodorizing effect with respect to the malodor of a space, especially a malodor in a water treatment area such as sewerage or the like, and a deodorizing method for a space using the same.例文帳に追加

空間の悪臭、特に下水などの水周り悪臭に対する消臭効果に優れた消臭剤組成物及びこれを用いた空間の消臭方法を提供する。 - 特許庁

To obtain a semiconducting watertight composition filled in a space among element wires of a conductor by the extrusion coating method with the intertwined conductor and can form a semiconducting layer or an inner semiconducting layer simultaneously, and an insulating electric wire in which this semiconducting watertight composition is filled in the space among element wires of a conductor and is coated on the conductor.例文帳に追加

撚り合わせ導体に対して、押出被覆法などにより導体素線間に水密性組成物を充填でき、この充填と同時に半導電層あるいは内部半導電層を形成できるような半導電水密組成物を得ることにある。 - 特許庁

To provide a positive type photoresist composition capable of forming a space pattern excellent in heat resistance and having a high aspect ratio on a thick film board with good perpendicularity and resolution and to provide a board with a photosensitive film, a resist pattern forming method and a method for preparing the photoresist composition.例文帳に追加

厚膜基板上で、耐熱性に優れ、高アスペクト比のスペースパターンを垂直性、解像性よく形成可能なポジ型ホトレジスト組成物、感光性膜付基板、レジストパターンの形成方法およびポジ型ホトレジスト組成物の製造方法の提供。 - 特許庁

To provide an actinic-ray- or radiation-sensitive resin composition that is satisfactory with respect to high sensitivity, high resolution of a dense pattern and an isolated line, sufficient exposure latitude, proper line width roughness, proper bridge margin and high resolution of isolated space, and to provide a method for forming a pattern using the composition.例文帳に追加

高感度、密集パターンおよび孤立ラインの高解像性、十分な露光余裕度、良好なラインウィズスラフネス、良好なブリッジマージン、孤立スペースの高解像性を同時に満足する感活性光線または感放射線樹脂組成物及びそれを用いたパターン形成方法を提供する。 - 特許庁

To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, roughness property, and resolution of isolated space patterns, and allows formation of a pattern having a good profile, as well as an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition.例文帳に追加

感度、ラフネス特性、孤立スペースパターンの解像性に優れ、かつ良好な形状のパターンを形成可能とする感活性光線性又は感放射線性樹脂組成物、並びに、それを用いた感活性光線性又は感放射線性膜、及び、パターン形成方法を提供すること。 - 特許庁

To provide an active ray-sensitive or radiation-sensitive composition having excellent roughness characteristics such as LWR (line width roughness), DOF (depth of focus) for an isolated space pattern (trench pattern) and exposure latitude, and to provide a resist film and a pattern forming method using the composition.例文帳に追加

ＬＷＲ等のラフネス特性、孤立スペースパターン（トレンチパターン）のＤＯＦ、及び露光ラチチュードに優れた感活性光線性又は感放射線性樹脂組成物、並びにそれを用いたレジスト膜及びパターン形成方法を提供する。 - 特許庁