真空加工室の英語

試料を試料保管室５及び／又は脱着型ケース１０に入れ、真空仕切り弁を開けた状態で、試料作製装置２０が備える真空排気装置により加工室２１を真空排気すれば、試料は真空環境で保管される。例文帳に追加

A sample can be preserved under vacuum environment by inserting the sample into the preserving chamber 5 and/or the detachable case 10 and evacuating the processing chamber 21 using an evacuation device equipped by the sample preparing device 20 under a condition opening the vacuum gate valve. - 特許庁

前記の微粒子試料加工保持材の固定部、微粒子試料加工保持材にＦＩＢを照射するＦＩＢ照射系および真空減圧系を備えた加工室を具備した試料加工装置。例文帳に追加

The sample processing apparatus has a processing chamber equipped with a part for fixing the particulate sample processing/retaining material, an FIB irradiation system for irradiating the particulate sample processing/retaining material with FIB, and a vacuum decompression system. - 特許庁

試料保管室５及び脱着型ケース１０内は、真空仕切り弁を介して加工室２１と連通可能である。例文帳に追加

Inner side of a sample preserving chamber 5 and the detachable case 10 can communicate with the processing chamber 21 through a vacuum gate valve. - 特許庁

副真空室１９は、弁用開口部１０を介して主真空室９に連設されると共に、被加工物１が部分的に密着する第２の開口部としての開口部２０を有している。例文帳に追加

The sub-vacuum chamber 19 is connected to the main chamber 9 through the valve opening 10 and has an opening 20 as a second opening to which a work 1 partly adheres. - 特許庁

ＤＣバイアス電圧に応答した制御を含む、真空プラズマプロセッサ室においてワークピースを加工する方法を提供する。例文帳に追加

To provide a method for processing a workpiece in a vacuum plasma processing chamber, including control in response to a DC bias voltage. - 特許庁

活性ガスが真空処理室３０に導入され、活性ガスによるウエハ２０の加工処理が開始される。例文帳に追加

The active gas is introduced to the vacuum processing chamber 30, and processing of the wafer 20 with the active gas is started. - 特許庁

真空熱処理炉１において高真空高温加熱処理を行った後のワークを、開閉扉２５を瞬時開閉する間に連通部２を通じて加工室３に放出、搬出して焼入れ処理を行う。例文帳に追加

The workpiece after being subject to high-vacuum high-temperature heat treatment at a vacuum heat-treating furnace 1 is delivered and carried out to a process chamber 3 through a communicating section 2 while an open and close door 25 is instantly opened or closed and is subject to quenching treatment. - 特許庁

真空ガス室にガスを注入した後、高周波電圧を印加するプラズマ加工装置において、高周波電圧の立ち上がり時におけるガスの異常反応を有効に防止し、安定したプラズマ加工作業を行う。例文帳に追加

To effectively prevent the abnormal reaction of gas at the time of the rising of high-frequency voltage in a plasma working device in which gas is blown into a vacuum gas chamber, and after that, high-frequency voltage is applied thereto and to execute stable plasma working operation. - 特許庁