strain relaxationとは 意味・読み方・使い方

To suppress relaxation of strain of an active layer even when a strained semiconductor element is formed on a fine active layer.例文帳に追加

微細な活性層上にひずみ半導体素子を形成しても、活性層のひずみの緩和を抑制することを可能にする。 - 特許庁

InAs dot formed by using strain relaxation on a GaAs layer is buried in a GaAs film 4 to a thickness not more than a thickness of dot thickness.例文帳に追加

ＧaＡs層上に歪み緩和を利用して形成したInＡsドットをＧaＡs膜でドットの厚さ以下の厚さまで埋め込む。 - 特許庁

Further, relaxation in the inner strain of the article is suppressed by releasing the article from the die immediately after pressing or by increasing the cooling rate.例文帳に追加

さらに、プレス直後に離型させるか、冷却速度をなるべく早くし、成形品の内部ひずみの緩和量を抑える。 - 特許庁

To provide a rubber composition for a sealing material which excels in stress relaxation properties and permanent compressive strain characteristics, and has high sealing performance.例文帳に追加

応力緩和性及び永久圧縮歪み特性に優れ、シール性能の高いシール材用ゴム組成物を提供する。 - 特許庁

To provide a multilayer film structure in which relaxation of strain of a germanium tin mixed crystal layer is promoted and a tensile-strained germanium layer with a larger in-plane tensile strain can be formed.例文帳に追加

ゲルマニウム錫混晶層の歪緩和を促進し、より大きな面内伸張歪を持つ伸張歪ゲルマニウム層を形成することができる多層膜構造体を提供する。 - 特許庁

The relaxation of the Ritsuryo system also forced Daigaku-ryo to lose its kangakuden, which was changed into Shoen (manors in medieval Japan), and put a strain on its finances, despite rescue measures targeting Daigaku-ryo, such as the offering of suiko (government loans, often seed rice, made to peasants in Japan from the 7th through 12th centuries), because they were not sufficient.発音を聞く 例文帳に追加

更に律令制の弛緩は勧学田の荘園化による喪失を招き、これに対して大学寮向けの出挙制度の整備などの措置が取られたものの十分とは言えず、大学寮財政を圧迫する事になる。 - Wikipedia日英京都関連文書対訳コーパス

A strain relaxation silicon germanium layer 12 with through-dislocation 14 is epitaxially grown on a silicon substrate 11, and then a metallic layer 13 is formed to manufacture a multilayer film intermediate structure 10.例文帳に追加

シリコン基板１１上に、貫通転位１４を有する歪緩和シリコンゲルマニウム層１２をエピタキシャル成長させ、次いで金属層１３を形成して多層膜中間構造体１０を作製する。 - 特許庁

The resin composition for the toner is ≥30 to ≤10^3 Pa in relaxation modulus G (0.1) 0.1 second after a shear strain of 450% is applied thereto under a condition of 190°C.例文帳に追加

１９０℃の条件下で４５０％の剪断ひずみを与えたときに、前記剪断ひずみを与えてから０．１秒後の緩和弾性率Ｇ（０．１）が３０Ｐａ以上１０^３Ｐａ以下であるトナー用樹脂組成物。 - 特許庁