Exposure Areaとは 意味・読み方・使い方

Each modulation are within the exposure area 1200 has a chance to execute exposure once for each pixel position within the exposure area 1200 for each row period when the photosensitive medium 1202 is moved in the exposure area 1200.例文帳に追加

感光媒体1202が露光領域1200内を移動するとき、露光領域1200内の各変調領域は露光領域1200内の各画素位置を行期間毎に一度露光する機会を有する。 - 特許庁

To provide a polarization exposure device relatively simple in structure, large in exposure energy and capable of performing a large area exposure.例文帳に追加

比較的簡単な構造で、露光エネルギー量が大きく、大面積の露光が可能な偏光露光装置を提供する。 - 特許庁

To provide an exposure apparatus that can appropriately shield a non-exposure area from light when pattern exposure is carried out by relatively moving a substrate and a mask.例文帳に追加

基板とマスクとを相対移動させることでパターン露光を行う際に、非露光領域を適切に遮光できる露光装置を提供する。 - 特許庁

To provide an exposure method with which alignment of an exposure area can be carried out with high accuracy and a process speed of exposure can be increased.例文帳に追加

露光領域の位置合わせを高精度に行うことができるとともに露光処理を高速化することができる露光方法を提供する。 - 特許庁

The control means (19) adjusts the exposure condition of each area calculated individually from proper exposure of each area of the photographed picture in a direction in which variation among the exposure conditions are suppressed and performs exposure control of the imaging device (13) under the exposure condition of each area after adjustment.例文帳に追加

この制御手段（１９）は、撮影画面の各エリアの適正露出から個別に算出される各エリアの露出条件を、それら露出条件間のバラツキが抑えられる方向に調整すると共に、その調整後の各エリアの露出条件の下で撮像素子（１３）の露出制御を行う。 - 特許庁

During exposure operation, vector data of a peculiar pattern PB is converted to raster data in accordance with a relative position of an exposure area, and fixed form raster data for exposure corresponding to the relative position of the exposure area is read out from the memory.例文帳に追加

露光動作のとき、露光エリアの相対位置に応じて固有パターンＰＢのベクタデータをラスタデータに変換するとともに、露光エリアの相対位置に応じた露光用定形ラスタデータをメモリから読み出す。 - 特許庁

From among the plurality of exposure devices 1, one or more exposure devices 1 where the dimensional difference between the respective exposure devices 1 of respective exposure patterns transferred by using the respective exposure devices 1 is within a prescribed allowable range are selected by each prescribed exposure area of the whole exposure areas 16.例文帳に追加

複数台の露光装置１について、各露光装置１を用いて転写される各露光パターンの各露光装置１間における寸法差が所定の許容範囲内に収まる露光装置１を、露光領域１６全体のうちの所定の露光領域ごとに１台ないしは複数台選び出す。 - 特許庁

To provide a periphery exposure apparatus and a periphery exposure method, with which it becomes possible to make uniform an exposure amount per substrate unit area within an exposure region on the occasion of exposure of the periphery of a circular substrate.例文帳に追加

円形の基板の周縁を露光するにあたって、基板単位面積あたりの露光量を露光領域内で揃えることができる周縁露光装置及び周縁露光方法を提供すること。 - 特許庁