oxynitridingとは 意味・読み方・使い方

When the oxynitriding treatment is performed, impurity concentration of the treating gas is measured and the oxynitriding treatment is performed according to the measured impurity concentration so that the film thickness or nitrogen concentration of the formed oxynitride film is within a predetermined range.例文帳に追加

酸窒化処理を行うに際して、処理ガスの不純物濃度を計測し、生成される酸窒化膜の膜厚又は酸窒化膜の窒素濃度が所定範囲内の値となるように、計測された不純物濃度に応じて当該酸窒化処理を行う。 - 特許庁

By the method, an oxynitriding aluminum film can be formed on the surface of the semiconductor substrate relatively quickly.例文帳に追加

この方法によると、半導体基板の表面に、酸窒化アルミニウム膜を比較的に短時間で形成することができる。 - 特許庁

The cover layer 9 on the transparent conducting thin film 5 is a layer comprising metal, or it is comprised by oxidizing, nitriding or oxynitriding a metal layer.例文帳に追加

透明導電薄膜５上の被覆層９は、金属よりなる被覆層或いは金属層を酸化、窒化又は酸窒化してなる。 - 特許庁

To provide a nitriding treatment apparatus and method which can efficiently perform nitriding treatment and can relatively rapidly form high-hardness hardened layers having excellent wear resistance etc., on members, parts, etc., made of steel at a low cost and an oxynitriding controller which can assure the safety of oxynitriding treatment in particular.例文帳に追加

効率的に窒化処理が行なえ、鋼製の部材、部品等に耐摩耗性等に優れた高硬度の硬化層を比較的短時間に低コストで形成できる窒化処理装置及び方法、並びに特に酸窒化処理の安全性を確保できる酸窒化制御装置を提供する。 - 特許庁

In a floating gate type transistor having a floating gate which is provided on a silicon board via a tunnel insulating film, and a control gate which is provided on the floating gate via an insulating film between gates, a first oxynitriding film 4 or a second oxynitriding film 8 is formed between a silicon board 1 and a tunnel oxide film 3, or between floating gate electrode 5 and the tunnel oxide film 3.例文帳に追加

シリコン基板上にトンネル絶縁膜を介して設けられた浮遊ゲートと、浮遊ゲート上にゲート間絶縁膜を介して設けられた制御ゲートを有する浮遊ゲート型トランジスタにおいて、シリコン基板１とトンネル酸化膜３との間あるいは浮遊ゲート電極５とトンネル酸化膜３との間に制御して第１酸窒化膜４あるいは第２酸窒化膜８が形成される。 - 特許庁

The treatment is carried out according to the measured impurity concentration, concretely, by adjusting and setting processing pressure in the oxynitriding treatment based upon the correlation so that the film thickness or nitrogen concentration is within a predetermined range.例文帳に追加

そして、当該相関関係に基づき、膜厚又は窒素濃度が所定範囲内の値となるように、計測された不純物濃度に応じて、具体的には酸窒化処理における処理圧力を調節設定して当該処理を行う。 - 特許庁

To efficiently discharge residual water, left in a reaction chamber as a result of a pyrogenic oxidizing process by performing two processes composed of the pyrogenic oxidizing process and an NO oxynitriding process as continuously as possible.例文帳に追加

パイロジェニック酸化処理とＮＯ酸窒化処理とからなる２つの処理をできるだけ連続に近い形で行わせて、パイロジェニック酸化処理で生じる残留水分を効率良く排出させる。 - 特許庁

After impurities that accelerate thermal oxidation are selectively introduced onto a silicon substrate surface by ion implantation or the like, the silicon substrate onto which the impurities are introduced is subjected to oxidation (dilution oxidation), oxynitriding or reoxidation continuously to form a plurality of kinds of gate insulating films having different film thicknesses on a semiconductor chip.例文帳に追加

シリコン基板表面に選択的に、熱酸化を増速させる不純物をイオン注入等で導入した後、上記不純物を導入したシリコン基板の酸化（希釈酸化）、酸窒化あるいは再酸化を連続して行い、半導体チップ上で膜厚の異なる複数種のゲート絶縁膜を形成する。 - 特許庁