controlled atmosphere heat treatmentとは 意味・読み方・使い方

In the manufacture of the superconductor essentially comprising a Bi2Sr2CaCu2OX compound superconductor phase, the oxygen partial pressure of the calcination atmosphere in the heat treatment to generate the crystallization heat is controlled to over 0.50 bar and ≤0.90 bar.例文帳に追加

Ｂｉ_2Ｓｒ_2ＣａＣｕ_2Ｏ_X化合物系物超伝導相を主体とする超伝導体の製造において、結晶生成熱処理における焼成雰囲気の酸素分圧を０．５０ｂａｒを超えて０．９０ｂａｒ以下とする。 - 特許庁

A component in the atmosphere near the shower plate is provided with a heat source to actively heat the shower plate, which is controlled to the temperature of the side wall of a treatment chamber or above.例文帳に追加

シャワープレート近傍の大気中部品に熱源を設けてシャワープレートを積極的に加熱し、処理室側壁と同等以上の温度に制御する。 - 特許庁

The electron density of a chromium atom which is contained in an chromium oxide catalyst supported on a fireproof compound and activated by a heat treatment in a nonreducing atmosphere is controlled.例文帳に追加

耐火性化合物上に支持され非還元雰囲気下で熱処理により活性化された酸化クロム触媒に含まれるクロム原子の電子密度を制御する。 - 特許庁

The electron density of a chromium atom is controlled by reducing an oxide chromium catalyst which is supported on a fireproof compound and activated by a heat treatment in a nonreducing atmosphere.例文帳に追加

耐火性化合物上に支持され非還元雰囲気下で熱処理により活性化された酸化クロム触媒を還元することによりクロム原子の電子密度を制御する。 - 特許庁

The present invention relates to a method of manufacturing a magnetic particle in which heat treatment is performed to a hexagonal ferrite magnetic body in an inert gas atmosphere where temperature is controlled within the range of 600-800°C.例文帳に追加

６００〜８００℃の範囲の温度に制御された不活性ガス雰囲気中で六方晶フェライト磁性体に加熱処理を施すことを特徴とする磁性粒子の製造方法。 - 特許庁

In the method and the system for controlling the atmosphere in the heat treatment furnace in this invention, the carburization is performed while supplying hydrocarbon-base gas and oxidizing gas into the furnace and the partial pressure of residual CH_4, the oxidizing gas and CO in the furnace are measured, and the supplying amount in each gas is controlled according to either value among these measured values.例文帳に追加

本発明の熱処理炉の雰囲気制御方法及び装置においては、炉内に炭化水素系ガスと酸化性ガスとを供給しながら浸炭を行い炉内の残留ＣＨ_4 、酸化性ガスの分圧及びＣＯ分圧を測定し、これらの何れかの値に応じて上記各ガスの供給量を制御せしめる。 - 特許庁

Moreover, the gate insulating film is formed by performing heat treatment to the lamination oxide film 7 at a higher temperature than a deposition temperature of the oxide film 6 and under a pressure-reduced oxygen atmosphere in which an oxygen concentration is controlled within a range of 0.05 Pa or more and 5 Pa or less.例文帳に追加

その上で、酸化膜６の堆積温度よりも高温で、且つ、酸素濃度が０．０５Ｐａ以上で５Ｐａ以下の範囲内に制御された減圧の酸素雰囲気下で、積層酸化膜７に対して熱処理を行うことで、ゲート絶縁膜を形成する。 - 特許庁

A heat treatment step A before sintering of heat treatment the crude laminate in the atmosphere, in which oxygen partial pressure is controlled so as to suitably oxidize the nickel included in the internal conductor film at a temperature D lower than the temperature for starting the sintering of a ceramic green layer and the conductor film in a sintering step B is performed between the binder removing step and the sintering step B.例文帳に追加

脱バインダ工程と焼成工程Ｂとの間に、焼成工程Ｂにおいてセラミックグリーン層および内部導体膜が焼結を開始する温度より低い温度Ｄ下において、内部導体膜に含まれるニッケルを適度に酸化させるように酸素分圧がコントロールされた雰囲気中で生の積層体を熱処理する、焼結前熱処理工程Ａを実施する。 - 特許庁