「film- thickness」に関連した英語例文の一覧と使い方(6ページ目) - Weblio英語例文検索

THICKNESS MEASURING METHOD AND THICKNESS MEASURING APPARATUS OF LAMINATED THIN FILM例文帳に追加

多層薄膜の膜厚測定方法および膜厚測定装置 - 特許庁

MEMBRANE THICKNESS INFORMATION ACQUIRING DEVICE, MEMBRANE THICKNESS ARITHMETIC UNIT, MEMBRANE THICKNESS MEASUREMENT SYSTEM AND MANUFACTURING METHOD OF FILM例文帳に追加

膜厚情報取得装置、膜厚演算装置、膜厚測定システムおよびフィルムの製造方法 - 特許庁

The thickness of an InxGa1-xN (0<x<1) well layer is 1.5-4.5 nm, and the thickness of a barrier layer is preferably 1.5-5.0 times the film thickness of the well layer.例文帳に追加

In_xGa_1-xN(0<X<1)well層の膜厚は1.5〜4.5[nm]、 barrier層の膜厚は、In_xGa_1-xN(0<X<1) well層の膜厚の1.5〜5.0倍が良い。 - 特許庁

Next, the difference in film thickness between a thin film formed, without installing the film thickness correction guide rod 8 and a thin film formed by installing only a piece of the film thickness correction guide rod 8, i.e., the width of decrease in the film thickness is measured (step S3).例文帳に追加

次に、膜厚補正ガイド棒８を設置することなく形成された薄膜と、膜厚補正ガイド棒８を１本だけ設置して形成した薄膜との膜厚の差、すなわち、膜厚の減少幅を測定する（ステップＳ３）。 - 特許庁

A wafer W and a film thickness measuring element 1(11) are installed on a susceptor 9, a film is deposited on the wafer and the film thickness measuring element 1(11), and the film thickness of the film deposited on the film thickness measuring element is measured.例文帳に追加

サセプター９上にウエハＷおよび膜厚計測素子１（１１）を設置し、ウエハ上および膜厚計測素子１（１１）上に膜を形成し、膜厚計測素子上に形成された膜の膜厚を測定する。 - 特許庁

The film thickness variation rate of a film thickness T_1 after developing to a film thickness T_0 before developing is effectively 90% or more.例文帳に追加

現像前の塗膜の膜厚Ｔ_０に対する現像後の膜厚Ｔ_１の膜厚変化率は、９０％以上であることが好ましい。 - 特許庁

A film thickness t1 of an underlying layer 120a, a film thickness t2 of a support surface layer 122a, and a film thickness t3 of an air surface layer 121a are made to be t2≤t3≤t1.例文帳に追加

基層１２０ａの膜厚ｔ１、支持体面層１２２ａの膜厚ｔ２、エア面層１２１ａの膜厚ｔ３をｔ２≦ｔ３≦ｔ１とする。 - 特許庁

To provide a film thickness measurement apparatus and a film thickness measurement method for accurately measuring a thickness of a thin film deposited on the substrate.例文帳に追加

基板上に成膜された薄膜の厚さを精度良く測定可能な膜厚測定装置及び膜厚測定方法を提供する。 - 特許庁

To provide a device for measuring film thickness and a film thickness measuring method capable of measuring film thickness of sheet materials continuously and accurately in non-contact fashion.例文帳に追加

シート材料の膜厚を非接触、連続的、且つ高精度で測定可能な膜厚測定装置及び膜厚測定方法の提供。 - 特許庁

A film thickness measuring part 20 determines whether the film thickness reaches a specified film thickness Y, based on the actual measurement factor Zb.例文帳に追加

膜厚計測部２０は、実測ファクタＺｂに基づいて規定膜厚Ｙに達するか否かを判定する。 - 特許庁

To provide a method for controlling the thickness of a tubular biaxially oriented film by which the biaxially oriented film free from thickness irregularity is manufactured as well as a device for controlling the film thickness.例文帳に追加

厚みムラのない二軸延伸フィルムを製造するチューブ状二軸延伸フィルムの厚み制御方法およびその装置を提供する。 - 特許庁

To provide a film thickness measuring instrument and a film thickness measuring method for a belt capable of measuring continuously a film thickness without stopping a measured object.例文帳に追加

被測定物を停止させず連続して膜厚が測定できるベルトの膜厚測定装置及び膜厚測定方法を提供する。 - 特許庁

To provide a measurement system of film thickness and a measurement method of the film thickness of sheet-like measured object, in which the film thickness of sheet is measured correctly supported over the sheet support surface of sheet support members.例文帳に追加

シート支持部材のシート支持面上に支持したシート膜厚を正確に測定できるようにすること。 - 特許庁

To provide a film thickness measuring device of a belt and a film thickness measuring method of the belt capable of measuring the film thickness of the belt accurately and continuously.例文帳に追加

精度良く、且つベルトの膜厚を連続して測定可能なベルトの膜厚測定装置及びベルトの膜厚測定方法を提供すること。 - 特許庁

A TEOS film as an interlayer insulating film 2 is formed on a silicon substrate 1 to have a thickness larger than a desired film thickness, e.g., to have a thickness of 2,000 nm.例文帳に追加

シリコン基板１上に、層間絶縁膜２としてＴＥＯＳ膜を所望の膜厚よりも厚い膜厚、例えば２０００ｎｍで形成する。 - 特許庁

To provide a method capable of simply confirming that formed film thickness is not less than set film thickness without measuring the film thickness after construction of an in-tube lining.例文帳に追加

管内ライニングの施工後に、膜厚を測定することなく簡易に形成膜厚が設定膜厚以上であることを確認する。 - 特許庁

To provide a liquid film thickness measuring instrument and a liquid film thickness measuring method, capable of accurately measuring the film thickness of a liquid existing on the surface of a roller.例文帳に追加

ローラー表面に存在する液体の膜厚を精度良く測定する液体膜厚計測装置および液体膜厚計測方法を提供する。 - 特許庁

To provide a film thickness monitor and a method for measuring thickness of film which can accurately measure the thickness of thin film sample.例文帳に追加

薄膜試料の膜厚測定を精度良く行うことができる膜厚モニタおよび膜厚測定方法を提供する。 - 特許庁

To provide a fluorescent X-ray film thickness meter capable of efficiently measuring film thickness corresponding to the thickness level of the film thickness, and a fluorescent X-ray film thickness measuring method.例文帳に追加

膜厚の厚みレベルに応じて効率よく、膜厚測定を行うことができる蛍光Ｘ線膜厚計及び蛍光Ｘ線膜厚測定法を提供することを目的とする。 - 特許庁

A correlation between a film thickness of the second film having been etched and a CD distribution of the first film, and film thickness characteristics of the second film having been etched are determined.例文帳に追加

エッチング後の第２の膜の膜厚と第１の膜のＣＤ分布の相関性と、エッチング後の第２の膜の膜厚特性とを求める。 - 特許庁

Then, the measured thermal oxidation film thickness is compared with the thermal oxidation thin film thickness standard (e), (f).例文帳に追加

次に、測定された熱酸化膜厚と熱酸化膜厚規格とを比較する（ｅ）、（ｆ）。 - 特許庁

A film thickness calculation part 63 calculates the film thickness d from a period T which is one of the coefficients.例文帳に追加

膜厚計算部６３は係数の１つである周期Ｔから膜厚ｄを算出する。 - 特許庁

Since growth rate differs depending on crystal plane, a film thickness t2 is formed larger than a film thickness t1.例文帳に追加

結晶面によって成長レートが異なるので、膜厚ｔ１よりも膜厚ｔ２を厚く形成できる。 - 特許庁

The film-thickness measuring apparatus 3 measures the thickness of an aluminum oxide film every one of electrode pads 8a-8f.例文帳に追加

膜厚測定装置３は、電極パッド８ａ〜８ｆ毎にアルミ酸化膜の厚みを測定する。 - 特許庁

A thermal oxidation film thickness standard after the thermal oxidation is set on the basis of the natural oxidation film thickness.例文帳に追加

次に、自然酸化膜厚に基づいて熱酸化後の熱酸化膜厚規格を設定する。 - 特許庁

To accurately find a film thickness of an electron injection layer having, for example, 10 nm or less of extremely thin film thickness.例文帳に追加

例えば、１０ｎｍ以下の極薄い膜厚を有する電子注入層の膜厚を正確に求める。 - 特許庁

FILM THICKNESS MEASURING METHOD, FILM THICKNESS MEASURING PROGRAM, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE例文帳に追加

膜厚計測方法、膜厚計測プログラム、及び半導体装置の製造方法 - 特許庁

Then, the film thickness showing the minimal point with a peak in the positive range is adopted as the thickness of the sample film (S10).例文帳に追加

そして正範囲のピークで極小を与える膜厚をその試料膜の膜厚とする（Ｓ１０）。 - 特許庁

Therefore, the second interlayer film becomes constant in thickness after a CMP process, and a residual film gets uniform in thickness.例文帳に追加

従ってＣＭＰ後の膜厚のばらつき（場所依存）が無くなり、残膜厚が均一になる。 - 特許庁

FILM THICKNESS MEASURING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND FILM THICKNESS MEASURING SYSTEM例文帳に追加

膜厚測定方法並びに半導体装置の製造方法および膜厚測定システム - 特許庁

REFLECTIVITY MEASUREMENT DEVICE, REFLECTIVITY MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT DEVICE, AND FILM THICKNESS MEASUREMENT METHOD例文帳に追加

反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法 - 特許庁

Further, the film thickness can be held constant by performing feedback control on the basis of the resultant measured value of the film thickness.例文帳に追加

また、その膜厚測定値をもとにフィードバック制御を行うことにより、膜厚を一定に保つ。 - 特許庁

The film thickness of the AlInP layer 4 and the GaInP layer 5 adjacent to each other is set irregularly in the direction of a film thickness.例文帳に追加

隣接するＡｌＩｎＰ層４とＧａＩｎＰ層５の膜厚は膜厚方向に不規則にする。 - 特許庁

To easily and accurately calculate the magnetic layer film thickness and the magnetic layer film thickness fluctuation of a magnetic recording medium.例文帳に追加

磁気記録媒体の磁性層膜厚及び磁性層膜厚変動を、簡便かつ正確に算出する。 - 特許庁

The thickness of the spacer layer can be corrected (additionally film-formed) and the compensation of film thickness error is permitted.例文帳に追加

スペーサ層の厚さを修正（追加成膜）することができ、膜厚誤差の補償が可能となる。 - 特許庁

The thickness of the film which gives the minimum point in the graph of the least square error, is regarded as the thickness of a sample film.例文帳に追加

そして、最小二乗誤差の極小点を与える膜厚をその試料膜の膜厚とする。 - 特許庁

FILM THICKNESS MEASURING METHOD, FILM THICKNESS MEASURING DEVICE, DEPOSITION DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE例文帳に追加

膜厚測定方法、膜厚測定装置、成膜装置及び半導体装置の製造方法 - 特許庁

FILM THICKNESS MEASURING APPARATUS, SURFACE TEMPERATURE MEASURING APPARATUS, FILM THICKNESS MEASURING METHOD AND SURFACE TEMPERATURE MEASURING METHOD例文帳に追加

膜厚測定装置、表面温度測定装置、膜厚測定方法および表面温度測定方法 - 特許庁

METHOD FOR CONTROLLING CARBON PROTECTION FILM THICKNESS AND DEVICE FOR CONTROLLING CARBON PROTECTIVE FILM THICKNESS例文帳に追加

カーボン保護膜の膜厚管理方法及びカーボン保護膜の膜厚管理装置 - 特許庁

The channel formation region 108 has a film thickness thinner than the film thickness of the impurity formation region 120.例文帳に追加

チャネル形成領域１０８の膜厚は、不純物形成領域１２０の膜厚よりも薄い。 - 特許庁

Then, the film thickness of the first base layer 2 is made thinner than the film thickness of the second base layer 3.例文帳に追加

そして、第１の下地層２の膜厚を第２の下地層３の膜厚より薄くした。 - 特許庁

To provide a film-thickness measuring apparatus by which a film thickness can be measured with high accuracy.例文帳に追加

高精度な膜厚測定を行うことができる膜厚測定装置を提供すること。 - 特許庁

To provide a bearing with an oil-film thickness measuring instrument that can measure the absolute thickness value of an oil film.例文帳に追加

油膜厚さの絶対値を測定することが可能な油膜厚さ測定装置付き軸受を提供する。 - 特許庁

CALIBRATION METHOD OF FILM THICKNESS MEASURING DEVICE, THE FILM THICKNESS MEASURING DEVICE AND CALIBRATION MEMBER例文帳に追加

膜厚測定装置の校正方法および膜厚測定装置および校正用部材 - 特許庁

LIQUID FILM THICKNESS MEASURING DEVICE, LIQUID FILM THICKNESS MEASURING METHOD, AND NIP ADJUSTING METHOD例文帳に追加

液体膜厚さ測定装置、液体膜厚さ測定方法およびニップ調整方法 - 特許庁