「x-ray diffraction intensity」に関連した英語例文の一覧と使い方 - Weblio英語例文検索

When calculating them, vector compensation is applied on X-ray diffraction intensity of each diffraction peak.例文帳に追加

算出に際しては、各回折ピークのＸ線回折強度についてベクトル補正を行う。 - 特許庁

INTENSITY CALCULATION METHOD OF DIFFRACTION SPOT IN X-RAY STRUCTURE ANALYSIS例文帳に追加

Ｘ線構造解析における回折斑点の強度算出方法 - 特許庁

To provide an X-ray diffraction device excellent in angle resolving power, reduced in the lowering of X-ray intensity and simplified in its structure in an X-ray diffraction method using a parallel beam method, and the X-ray diffraction method.例文帳に追加

平行ビーム法を用いたＸ線回折法において、角度分解能が優れていて、Ｘ線強度の低下が少なく、構造が簡素化されたＸ線回折装置およびＸ線回折方法を提供する。 - 特許庁

In the resultant cubical boron nitride sintered compact, the ratio I_220/I_111 of X-ray diffraction intensity I_220 in (220) plane to X-ray diffraction intensity I_111 in (111) plane is ≥0.1.例文帳に追加

得られた立方晶窒化ホウ素焼結体の（２２０）面のＸ線回折強度Ｉ_220と、（１１１）面のＸ線回折強度Ｉ_111との比Ｉ_220／Ｉ_111は０．１以上である。 - 特許庁

(Co.fcc)≤0.1, where I(Co.hcp) denotes the X-ray diffraction intensity in the (101) face of Co with an hcp structure, and I(Co.fcc) denotes the X-ray diffraction intensity in the (111) face of Co with an fcc structure.例文帳に追加

０≦Ｉ(Co・hcp)／Ｉ(Co・fcc)≦０．１ ここで、Ｉ(Co・hcp)はhcp 構造のＣｏの(101) 面におけるＸ線回折強度で、Ｉ(Co・fcc)はfcc 構造のＣｏの(111) 面におけるＸ線回折強度である。 - 特許庁

X-RAY DIFFRACTION DEVICE EQUIPPED WITH TWO-DIMENSIONAL DETECTOR, AND DELETION METHOD OF ITS BLANK INTENSITY例文帳に追加

２次元検出器を備えたＸ線回折装置とそのブランク強度の削除方法 - 特許庁

The integrated intensity of the diffracted X-ray on the X-ray recording region is determined in a region inside the intensity calculation frame 26, and the result is used as the intensity of the diffraction spot 34.例文帳に追加

強度算出枠２６の内側の領域で，Ｘ線記録領域上の回折Ｘ線の積分強度を求めて，これを回折斑点３４の強度とする。 - 特許庁

To provide an X-ray diffraction device capable of acquiring sufficient diffraction line intensity in a 2θ high angle domain where the diffraction line intensity is weakened, when the sample quantity is small, and maintaining accurately relative X-ray intensity of a diffraction peak in a 2θ middle angle domain and in a 2θ low angle domain where the X-ray irradiation width is widened.例文帳に追加

試料の量が少ない場合に、回折線強度が弱くなる２θ高角度領域で十分な回折線強度を獲得でき、Ｘ線照射幅が広くなる２θ中角度領域及び２θ低角度領域において回折ピークの相対Ｘ線強度を正しく維持できるＸ線回折装置を提供する。 - 特許庁

Alternatively, in the range of discharge depth of 50-90%, the relationship of a minimum value I1 of X-ray diffraction intensity of at least one or more X-ray diffraction peak to X-ray diffraction intensity I0 at 100% of discharge depth satisfies I1/I0>0.5.例文帳に追加

または、放電深度５０％〜９０％の範囲内において、少なくとも１以上のＸ線回折ピークのＸ線回折強度の最小値Ｉ_1 が放電深度１００％でのＸ線回折強度Ｉ_0 に対しＩ_1／Ｉ_0＞０．５なる関係を満たす。 - 特許庁

The X-ray intensity data are improved by measuring diffraction X rays from the metallic phase contained in the plated layer at a plurality of positions to the same Debey ring and integrating the obtained diffraction X-ray intensity data.例文帳に追加

めっき層に含まれる金属相からの回折Ｘ線を、同一のデバイ環に対して複数の位置で測定し、得られる回折Ｘ線強度データを積算することにより、Ｘ線強度データを高める。 - 特許庁

An X-ray generator 1 emits an X-ray to a sample 3 of oxide heated in a high temperature chamber 4, and a two-dimensional X-ray detector 5 measures X-ray diffraction intensity in the sample 3.例文帳に追加

高温チャンバー４内で加熱されている酸化物の試料３に対してＸ線発生装置１からＸ線を照射し、試料３におけるＸ線回折強度を、二次元Ｘ線検出器５により測定する。 - 特許庁

Cellulose I type crystallinity degree (%)=[(I_22.6-I_18.5)/I_22.6]×100 (1) [wherein I_22.6 represents the diffraction intensity of lattice plane (plane 002) (diffraction angle 2θ=22.6°) and I_18.5 represents the diffraction intensity of amorphous part (diffraction angle 2θ=18.5°) in X-ray diffraction].例文帳に追加

セルロースＩ型結晶化度（％）＝〔（Ｉ_22.6−Ｉ_18.5）／Ｉ_22.6〕×１００ （１）〔Ｉ_22.6は、Ｘ線回折における格子面（００２面）（回折角２θ＝２２．６°）の回折強度、及びＩ_18.5は、アモルファス部（回折角２θ＝１８．５°）の回折強度を示す〕 - 特許庁

In the aluminum nitride powder, the intensity ratio I(002)/I(100) of diffraction peak of (002) plane to that of (100) plane in X-ray diffraction using a Cu-Kα ray is 0.2-0.5.例文帳に追加

Cu−Kα線を用いたX線回折において（００２）面と（１００）面からの回折ピークの強度比Ｉ（００２）／Ｉ（１００）が０．２〜０．５であることを特徴とする窒化アルミニウム粉末。 - 特許庁

To provide an X-ray diffraction apparatus in which an X-ray diffraction of a thin film formed on a cylindrical basic body, including an electrophotographic photosensitive body, can be measured with sufficient intensity.例文帳に追加

電子写真感光体を始めとする円筒状の基体の上に形成された薄膜のＸ線回折を十分な強度で測定することができるＸ線回折装置を提供する。 - 特許庁

Intensity (I) of a (200) plane obtained by X-ray diffraction of a rolled surface, after it is recrystallized through annealing satisfies I/I0<20, where (I0) is the intensity of the (200) plane obtained by X-ray diffraction of fine powder copper.例文帳に追加

焼鈍を行って再結晶組織にした後の圧延面のＸ線回折で求めた（２００）面の強度（Ｉ）が、微粉末銅のＸ線回折で求めた（２００）面の強度（Ｉ_０）に対し、 Ｉ／Ｉ_０＜２０である。 - 特許庁

The copper conductor for the audio/video signal is formed so that an X-ray diffraction intensity I (111) of a (111) face and the X-ray diffraction intensity I (200) of a (200) face at irradiating the X-ray to the cross-section satisfies I (111)≥15×I (200).例文帳に追加

オーディオ・ビデオ信号用銅導体は、横断面にＸ線を照射したときの（１１１）面のＸ線回折強度Ｉ（１１１）と（２００）面のＸ線回折強度Ｉ（２００）とがＩ（１１１）≧１５×Ｉ（２００）の関係を満たすように形成されている。 - 特許庁

It is preferable that the molding has a sheet shape and the intensity ratio, I_(002)/I_(110) of intensity I_(110) of a diffraction peak at a (110) plane of carbon to intensity I_(002) of a diffraction peak at a (002) plane in an X-ray diffraction chart obtained by irradiating X-ray in the thickness direction of the sheet, is ≤10.例文帳に追加

成形体がシート状をなし、その厚み方向にＸ線を照射して得られる黒鉛粉末のＸ線回折図における炭素の（１１０）面の回折ピークの強度Ｉ_(110)に対する（００２）面の回折ピークの強度Ｉ_(002)の比Ｉ_(002)／Ｉ_(110)が１０以下であることが望ましい。 - 特許庁

In the copper alloy, the integrated intensity ratio I {200}/I{111} obtained by X-ray diffraction regarding a rolling face is ≤1.5.例文帳に追加

圧延面についてのＸ線回折により求まる積分強度比Ｉ｛２００｝／Ｉ｛１１１｝が１.５以下である銅合金。 - 特許庁

To calibrate the intensity of X-rays with high accuracy for a short time in quantitative analysis by an X-ray diffraction method using a monochromator.例文帳に追加

モノクロメータを用いたＸ線回折法での定量分析において、短時間で高精度なＸ線強度の較正を実現する。 - 特許庁

The crystal transformation index of the insulating layer, which is obtained from the diffraction intensity by an X-ray diffraction method, is at least a predetermined value, and preferably at least 0.6.例文帳に追加

絶縁層のＸ線回折法の回折強度から求まる結晶変換指数が所定の値以上、好ましくは、０．６以上とする。 - 特許庁

In the expression, I{420} represents an X-ray diffraction intensity of a crystal face {420} on the plate surface of the copper alloy plate material, and I_0{420} represents an X-ray diffraction intensity of the crystal face {420} of a standard powder of pure copper.例文帳に追加

Ｉ｛４２０｝／Ｉ_0｛４２０｝＞１.０ ……（１） ここで、Ｉ｛４２０｝は当該銅合金板材の板面における｛４２０｝結晶面のＸ線回折強度、Ｉ_0｛４２０｝は純銅標準粉末の｛４２０｝結晶面のＸ線回折強度である。 - 特許庁

In the evaluation method for evaluating a silicon wafer that has been subjected to heat treatment, the X-ray diffraction intensity of the silicon wafer is measured by an X-ray diffraction method, thus evaluating the IG capability of the silicon wafer.例文帳に追加

熱処理後のシリコンウェーハの評価方法であって、Ｘ線回折法によりシリコンウェーハのＸ線回折強度を測定することによって当該シリコンウェーハのＩＧ能力を評価するようにした。 - 特許庁

(3) an intensity peak ratio I_003/I_110 of the diffraction peak intensity I_003 of the (003) planes determined in the X-ray diffraction image and diffraction peak intensity I_110 in the (110) planes in the vicinity of 2θ=66° is 4 to 10.例文帳に追加

（３）前記Ｘ線回折像において測定される前記（００３）面回折ピーク強度Ｉ_００３と２θ＝６６°付近の（１１０）面回折ピーク強度Ｉ_１１０との強度比Ｉ_００３／Ｉ_１１０が、４以上１０以下であること。 - 特許庁

The integrated intensity of X-ray diffraction on a rolled surface of the copper alloy satisfy the relations (1): 30≤(I/I_0{220})/(I/I_0{200})≤95 and (2) 0.36≤2×(I/I_0{111})+(I/I_0{311})≤0.48.例文帳に追加

（１）３０≦（Ｉ／Ｉ_0｛２２０｝）／（Ｉ／Ｉ_0｛２００｝）≦９５、（２）０．３６≦２×（Ｉ／Ｉ_0｛１１１｝）＋（Ｉ／Ｉ_0｛３１１｝）≦０．４８ - 特許庁

An intensity ratio [I(200)/I(111)] between crystal orientation faces (200) and (111) measured by X-ray diffraction of the nickel belt is set to ≥5.0.例文帳に追加

ニッケルベルトのＸ線回折により測定される結晶配向面(200)と(111)の強度比〔Ｉ(200)/Ｉ(111)〕を５．０以上とする。 - 特許庁

In addition, the coefficient of variation of the first peak intensity showing the maximum intensity in an X-ray diffraction pattern inside a stimulable phosphor layer face is set at 40% or lower.例文帳に追加

そして、輝尽性蛍光体層面内のＸ線回折パターンにおいて最大強度を示す第１ピーク強度の変動係数を４０％以下とする。 - 特許庁

Related to the coat 12, A/B is 1 or higher for an X-ray diffraction pattern, where A is a peak intensity on (111) surface while B is a peak intensity on (220) surface.例文帳に追加

皮膜１２は，Ｘ線回折パターンにおける，（１１１）面のピーク強度をＡ，（２２０）面のピーク強度をＢとした場合，Ａ／Ｂが１以上である。 - 特許庁

Related to silicon carbide, A/B is 1 or higher for an X-ray diffraction pattern, where A is a peak intensity on (111) surface while B is a peak intensity on (220) surface.例文帳に追加

かつ，炭化珪素体は，Ｘ線回折パターンにおける，（１１１）面のピーク強度をＡ，（２２０）面のピーク強度をＢとした場合，Ａ／Ｂが１以上である。 - 特許庁

This method yields the porcelain composition containing merwinite as a crystal phase, wherein a main diffraction intensity of X ray diffraction of a co-existing akermanite corresponds to ≤6% of a main diffraction intensity of the merwinite crystal.例文帳に追加

この方法によれば、メルウィナイトを結晶相として含有し、共存するアケマナイト結晶のＸ線回折における主回折強度がメルウィナイト結晶の主回折強度の６％以下である磁器組成物が得られる。 - 特許庁

The cellulose I type crystallinity (%)=[(I_22.6-I_18.5)/I_22.6]×100 wherein, I_22.6 is a diffracted intensity of a lattice plane (angle of diffraction 2θ= 22.6°) in X-ray diffraction; and I_18.5 is a diffracted intensity of an amorphous portion (angle of diffraction 2θ= 18.5°).例文帳に追加

セルロースＩ型結晶化度（％）＝〔（Ｉ_22.6−Ｉ_18.5）／Ｉ_22.6〕×１００〔Ｉ_22.6は、Ｘ線回折における格子面（回折角２θ＝２２．６°）の回折強度、及びＩ_18.5は、アモルファス部（回折角２θ＝１８．５°）の回折強度を示す〕 - 特許庁

The unnecessary diffraction X-ray included in the diffraction X-ray beam is removed by a pinhole 109, and only diffraction light 108 from the irradiation area of the Bessel beam on the sample 106 is made to get incident into a detector 110, so as to measure intensity thereof.例文帳に追加

そして、回折Ｘ線ビームに含まれる不要な回折Ｘ線をピンホール１０９により除去して、試料１０６上のベッセルビームの照射領域からの回折光１０８のみを検出器１１０に入射させて強度測定を行なう。 - 特許庁

The HC adsorbent has high heat resistance and keeps high XRD (X-ray diffraction) intensity after tested for heat resistance and durability.例文帳に追加

当該ＨＣ吸着剤は、耐熱性が高く耐熱耐久処理後におけるＸＲＤ回折強度が高く維持される。 - 特許庁

In the X-ray diffraction pattern of the NOx absorbent material a peak due to the (111) face of BaCO3 is present and the intensity ratio (IA/IF) of the intensity IA of the peak after long-term use to the initial intensity IF is 0.2-1.例文帳に追加

そのＸ線回折パターンには、ＢａＣＯ_３の（１１１）面のピークが存在し、このピークの耐久後強度（Ｉ_Ａ）と初期強度（Ｉ_Ｆ）との強度比Ｉ_Ａ／Ｉ_Ｆが、０．２〜１である。 - 特許庁

An angle ω0 where the intensity of light from the light source 4 entering the photodetector 5 is maximized, and an angle ω1 where the intensity of diffraction X-rays which are detected by an X-ray diffraction system that is set at a specific angle is maximized, are measured.例文帳に追加

次いで、測定対象試料を装着して同様に光強度が最大になる角度ω_２と回折Ｘ線強度が最大になる角度ω_３を測定し、次式に基づき測定対象試料の偏差角δを求める。 - 特許庁

An example of a graph of diffraction intensity by an X-ray diffraction method of the obtained ITO film (as shown), and a strong peak corresponding to the (400) plane of ITO is observed.例文帳に追加

選択図には得られたＩＴＯ膜のＸ線回折法による回折強度のグラフの一例を示し、ＩＴＯの（４００）面に対応する強いピークが観測されている。 - 特許庁

The formula (1): orientation α=(180-Δβ)/180, provided that Δβ expresses a half width when the X-ray diffraction intensity distribution from 0 to 360° azimuth angle direction is measured by fixing a peak scattering angle in the X-ray diffraction measurement.例文帳に追加

配向度α＝（１８０−Δβ）／１８０…（１）（但し、Δβは、Ｘ線回折測定によるピーク散乱角を固定して方位角方向の０〜３６０度までのＸ線回折強度分布を測定したときの半値幅を表す。） - 特許庁

In the expression, β is an angle defined by an incident plane of the incident X-ray and one direction in a surface of the transparent support, and I is diffraction intensity at 2θ=8° in an X-ray diffraction chart measured at the angle β.例文帳に追加

上記式中、βは、入射するＸ線の入射面と前記透明支持体面内のある１方向とのなす角度であり、Ｉは、角度βで測定したＸ線回折チャートにおける２θ＝８°での回折強度である。 - 特許庁

(2) An intensity ratio I_003/I_104 of diffraction peak intensity I_003 of (003) planes in the vicinity of 2θ=19° determined in the X-ray diffraction image and diffraction peak intensity of (104) planes in the vicinity of 2θ=44° is 1.0 to 1.5.例文帳に追加

（２）前記Ｘ線回折像において測定される２θ＝１９゜付近の（００３）面回折ピーク強度Ｉ_００３と２θ＝４４°付近の（１０４）面回折ピーク強度Ｉ_１０４との強度比Ｉ_００３／Ｉ_１０４が、１．０より大きく１．５より小さいこと。 - 特許庁

An Ni_3Sn_4 film, in which the thin film X-ray diffraction peak intensity ratio between SnO and Ni_3Sn_4, that is, SnO/Ni_3Sn_4 satisfies ≤0.046, is formed on the surface of a metal plate.例文帳に追加

金属板の表面に、SnＯとNi_3Sn_4の薄膜Ｘ線回折ピーク強度比SnＯ／Ni_3Sn_4が0.046以下を満足するNi_3Sn_4系皮膜を形成する。 - 特許庁

The fullerene whose half-width of peak of maximum intensity measured by X-ray diffraction is 0.20 ° or larger is reacted with the reactive gas.例文帳に追加

Ｘ線回折測定における最大強度のピークの半値幅が０．２０°以上であるフラーレン類と反応性ガスとを反応させる。 - 特許庁

The plate particles have a peak intensity ratio [003]/[104] of 1.6 or less in X-ray diffraction, and an aspect ratio of 2.1 to 20.例文帳に追加

板状粒子においては、Ｘ線回折におけるピーク強度比［００３］／［１０４］が１．６以下であり、アスペクト比が２．１〜２０である。 - 特許庁

The α-Mn_2O_3 has a new crystal structure in which peak intensity of lattice planes in X-ray diffraction satisfies (222)<(400).例文帳に追加

Ｘ線回折における格子面のピーク強度が（２２２）＜（４００）である新規な結晶構造を有するα−Ｍｎ_２Ｏ_３を用いる。 - 特許庁

Moreover, the distribution of the first peak intensity showing the maximum intensity in an X-ray diffraction pattern inside a stimulable phosphor layer face is isotropic from the center of the support 11.例文帳に追加

そして、輝尽性蛍光体層面内のＸ線回折パターンにおいて最大強度を示す第１ピーク強度の分布が支持体中心から等方的である。 - 特許庁

The imaging device comprises an X-ray source 110, a diffraction grating 130 for diffracting X-rays emitted from the X-ray source 110, a shielding grating 150 for shielding a part of the X-rays diffracted by the diffraction grating 130 and a detector 170 for detecting intensity distribution of the X-rays having passed through the shielding grating 150.例文帳に追加

撮像装置はＸ線源１１０とＸ線源１１０から出射したＸ線を回折する回折格子１３０と回折格子１３０によって回折されたＸ線の一部を遮る遮蔽格子１５０と遮蔽格子１５０を経たＸ線の強度分布を検出する検出器１７０とを有する。 - 特許庁

The rolled copper foil, when recrystallization-annealed, develops a texture in which the intensity (I) of a rolled face (200) determined by X-ray diffraction has such a relation with the intensity (I_0) of the face (200) on the fine powder of copper determined by the X-ray diffraction, as to satisfy I_(200)/I_0(200)<1.0.例文帳に追加

再結晶焼鈍を施すことにより、Ｘ線回折で求めた圧延面の（２００）面の強度（Ｉ）が、微粉末銅のＸ線回折で求めた（２００）面の強度（Ｉ_０）に対し、Ｉ_（２００）／Ｉ_０（２００）＜１．０である集合組織が発現することを特徴とする圧延銅箔 - 特許庁